Resist Composition for High Focus Margin Lithography
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Solution Overview
Problem
Conventional resist compositions often fail to meet the focus margin requirements for producing resist patterns, leading to an increase in defects in the resulting patterns.
Innovation Solution
A resist composition comprising a resin with specific structural units and an acid generator, where the resin is insoluble in alkali aqueous solutions but becomes soluble upon acid action, is developed. This composition includes structural units represented by formulas (I) and (II), with specific groups and bonds that enhance solubility and pattern resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used, then manufacturing process is simple, but focus margin is insufficient and pattern defects increase
Solution Approach 1:
The patent uses a composite resin system comprising a first resin with specific structural units (formula I) providing acid-labile groups, and a second resin providing solubility control, combined with a specific acid generator (formula II). This composite material approach enables precise solubility modulation upon acid generation, improving focus margin while maintaining pattern fidelity.
Solution Approach 2:
The patent modifies chemical parameters of the resist composition by introducing specific structural units with defined solubility characteristics (formula I containing acid-labile groups) and controlling the molecular weight and composition ratios. These parameter changes enable the resin to transition from insoluble to soluble state upon acid action, thereby improving focus margin and reducing pattern defects.
2Manufacturing precision
If resin solubility is increased to improve pattern formation, then pattern resolution improves, but focus margin becomes insufficient
Solution Approach 1:
The patent introduces dynamic solubility control through acid-labile structural units (formula I) that remain insoluble in alkali aqueous solution under normal conditions but become soluble upon acid generation during exposure. This dynamic transition enables the resin to maintain stability during processing (ensuring focus margin) while allowing controlled dissolution for pattern formation (ensuring pattern resolution).
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition improves the focus margin and reduces defects in resist patterns by ensuring precise solubility changes in response to acid action, leading to better pattern formation and resolution.
Implementation Method 1
a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid
Data Source
AI summary
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II),wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W, Rf1 and Rf2, n and Z+ are defined in the specification.