Resist Composition for High Resolution Lithography
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Solution Overview
Problem
Conventional resist compositions often fail to achieve satisfactory focus margin and result in an increased number of defects in the resist patterns produced.
Innovation Solution
A resist composition comprising a resin with specific structural units and an acid generator, designed to be insoluble in alkali aqueous solutions but becoming soluble upon acid action, is applied to a substrate, dried, exposed, heated, and developed to produce a defect-free resist pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used, then manufacturing process is simple, but focus margin is insufficient and defect number increases
Solution Approach 1:
The patent uses a composite resin system comprising multiple specific structural units (u-A, u-B, u-C, u-D) with defined molecular weight ratios. This composite material approach allows optimization of both focus margin and pattern quality by combining different functional units in precise proportions, resolving the contradiction between manufacturing precision and composition complexity.
Solution Approach 2:
The patent specifies precise parameter ranges including molecular weight ratios (u-A)/(u-B) of 0.01-10, (u-C)/(u-D) of 0.1-20, and molecular weight distributions (Mw/Mn) of 1.05-1.50. By controlling these parameters within defined ranges, the invention achieves improved focus margin while maintaining manageable manufacturing complexity through quantifiable specifications.
2Manufacturing precision
If conventional resist composition is used, then composition structure is simple, but pattern defect number increases
Solution Approach 1:
The patent employs a composite resin containing four distinct structural units (u-A, u-B, u-C, u-D) with specific functional characteristics. This composite structure reduces pattern defects by combining units with complementary properties: u-A and u-B provide backbone stability, while u-C and u-D enable controlled solubility changes during processing, achieving high pattern quality despite increased compositional complexity.
Solution Approach 2:
The patent assigns different functional roles to different structural units within the resin molecule. Structural units u-A and u-B provide structural stability, while units u-C and u-D are designed to undergo specific chemical changes during exposure and development. This local differentiation of functional qualities within the composite resin enables precise control over pattern formation and defect reduction.
3Manufacturing precision
If resin with specific structural units is used, then focus margin improves, but resin solubility control becomes more complex
Solution Approach 1:
The patent controls solubility through precise parameter specifications: the ratio of structural units (u-A)/(u-B) ranges from 0.01 to 10, and (u-C)/(u-D) ranges from 0.1 to 20. These parameter controls enable the resin to maintain insolubility in alkali aqueous solution under normal conditions while becoming soluble after acid action, achieving improved focus margin with manageable solubility control complexity.
Solution Approach 2:
The resin exhibits dynamic solubility characteristics that change during the lithography process. Initially, the resin with its specific structural unit composition remains insoluble in alkali aqueous solution, providing stable pattern formation during exposure. After acid action during development, the resin's solubility dynamically changes to become soluble, enabling pattern transfer. This dynamic behavior resolves the contradiction between focus margin improvement and solubility control complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition effectively improves the focus margin and reduces defects in the resist patterns, achieving high resolution and dry etching resistance.
Implementation Method 1
an acid generator, which produces an acid upon exposure to light
Implementation Method 2
a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid
Data Source
AI summary
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II),wherein R1, A1, R2, Q1 and Q2, L1, ring W, Rf1 and Rf2, n and Z+are defined in the specification.