Resist Composition CD Uniformity via Formula I Compound
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Solution Overview
Problem
Existing resist compositions struggle to achieve satisfactory CD uniformity in resist patterns.
Innovation Solution
A resist composition comprising a resin with an acid-labile group, an acid generator, and a specific compound represented by formula (I), along with a method involving application, drying, exposure, heating, and development steps to produce a resist pattern with improved CD uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used, then the basic resist pattern formation is achieved, but the CD uniformity is insufficient
Solution Approach 1:
The patent modifies the chemical structure of the carboxylic acid component by introducing specific structural features (formula I with defined R1, X1, L1, R2, u1, s1, t1, n parameters) to optimize the resist composition's performance. This structural parameter change improves CD uniformity while maintaining reliable pattern formation
Solution Approach 2:
The patent creates a composite resist composition system combining a resin with acid-labile groups, an acid generator, and a specifically structured carboxylic acid compound. This composite approach synergistically improves both CD uniformity and pattern formation quality that cannot be achieved with single components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition effectively produces resist patterns with enhanced CD uniformity through the combination of the resin, acid generator, and compound (I) in the described process.
Implementation Method 1
a resin including a structural unit having an acid-labile group, an acid generator
Implementation Method 2
a step of heating the exposed composition layer
Data Source
AI summary
The present invention can provide a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition.A resist composition comprising a resin including a structural unit having an acid-labile group, an acid generator and a compound represented by formula (I):wherein, in formula (I),R1 represents a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent,X1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O—, and * represents a bonding site to R1,L1 represents a single bond or a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO2—,R2 represents a saturated hydrocarbon group having 1 to 12 carbon atoms,u1 represents an integer of 0 to 2,s1 represents 1 or 2,t1 represents 0 or 1, in which s1+t1 is 1 or 2,n represents an integer of 2 or more, anda plurality of X1, L1, s1, t1, R2 and u1 each may be the same or different from each other.