Resist Composition with Formula I Structural Unit for CD Uniformity

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Solution Overview

Problem

Existing resist compositions struggle to achieve uniformity in critical dimension (CD) of resist patterns, which is crucial for precise microfabrication processes.

Innovation Solution

A resist composition incorporating a specific resin structural unit represented by formula (I), which includes various bonding configurations and substituents, is applied to form a pattern with improved CD uniformity (CDU).

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional resist compositions are used, then the resist pattern can be formed, but the critical dimension (CD) uniformity is insufficient

Engineering Contradiction:
ImproveCD uniformityVSAvoidpattern formation quality
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent modifies the chemical structure of the resin by introducing specific structural units with formula (I) containing various bonding configurations (single bond, ether bond, ester bond, amide bond, carbonic acid ester bond) and substituent groups. These parameter changes in molecular structure improve the resist composition's ability to form patterns with better CD uniformity while maintaining reliable pattern formation

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite resin structure by combining multiple bonding types and substituent groups within the structural unit represented by formula (I). This composite approach integrates different chemical bonding characteristics to achieve both improved CD uniformity and reliable pattern formation, resolving the contradiction between precision and reliability

Inventive Principle:
Principle #40Composite materials

Data Source

PatentUS20240255846A1Compound, resin, resist composition and method for producing resist pattern
Publication Date: 2024.08.01 SUMITOMO CHEM CO LTD
  • US20240255846A1 patent drawing
  • US20240255846A1 patent drawing
  • US20240255846A1 patent drawing

AI summary

Disclosed are a resin including a structural unit represented by formula (I), and a resist composition comprising the same:wherein R0 represents a hydrogen atom or a halogen atom; X1 represents *—CO—O—**, *—O—CO—O—**, etc.; L1 represents a single bond or a substituted/unsubstituted hydrocarbon group; Ar represents a substituted/unsubstituted aromatic hydrocarbon group; A1 represents hydrocarbon group; R2 represents a halogen atom, a haloalkyl group, etc.; R3 represents a group represented by formula (5a), etc.; m1 represents an integer of 1 to 6; m2 represents an integer of 0 to 3; L10 represents a single bond or an alkanediyl group; m51 and m52 each represent 0 or 1; Raa1 and Raa2 each represent a hydrogen atom or a hydrocarbon group; Xa represents a single bond, S, O, etc.; and Raa3 represents a hydrocarbon group, etc.