Resist Composition for Wide Focus Margin and Line Edge Roughness
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Solution Overview
Problem
Conventional resist compositions fail to achieve satisfactory wide focus margin and pattern line edge roughness in resist patterns.
Innovation Solution
A resist composition containing a resin with specific structural units, an acid generator, and a compound, applied onto a substrate, dried, exposed, and developed to form a resist pattern with improved focus margin and line edge roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used, then basic resist pattern can be formed, but focus margin is narrow and line edge roughness is poor
Solution Approach 1:
The patent changes the chemical parameters of the resist composition by introducing a specific compound with formula (II) containing heterocyclic groups and adjustable substituents (R3, R4, m, n). This compound modifies the resist's chemical structure to achieve both narrow line edge roughness and wide focus margin simultaneously, resolving the contradiction between manufacturing precision and reliability
Solution Approach 2:
The patent creates a composite resist composition by combining the resin (A), acid generator (B), and the novel compound (II) in specific proportions. This composite material approach allows the resist to exhibit improved properties that neither component alone could achieve, specifically achieving both good line edge roughness and wide focus margin
2Reliability
If conventional resist composition is used, then resist pattern can be manufactured, but focus margin and line edge roughness are not satisfied
Solution Approach 1:
The patent modifies the chemical composition parameters by incorporating compound (II) with specific heterocyclic structure and variable substituents. This parameter change enables the resist to achieve both wide focus margin and excellent line edge roughness, simultaneously improving both reliability and manufacturing precision
3Reliability
If resin with specific structural unit is used, then wide focus margin is achieved, but line edge roughness may be affected
Solution Approach 1:
The patent applies local quality by introducing compound (II) with specific functional groups (heterocyclic ring X1, substituents R3, R4) that locally modify the resist composition's properties. This localized chemical modification enables the resist to achieve wide focus margin while maintaining excellent line edge roughness through targeted molecular structure design
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves a wide focus margin and excellent pattern line edge roughness, making it suitable for semiconductor microfabrication and other photofabrication processes.
Implementation Method 1
an acid generator and (D) a compound represented by the formula (II)... (3) exposing the composition layer; (4) heating the exposed composition layer
Implementation Method 2
heating the exposed composition layer
Data Source
AI summary
A resist composition contains (A) a resin having a structural unit represented by the formula (I), (B) an acid generator and (D) a compound represented by the formula (II),wherein R1, ring X1, R3, R4, m, and n are defined in the specification.