Positive Resist Composition Rectangularity via Dissolution Inhibitor
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Solution Overview
Problem
Conventional chemically amplified positive resist compositions often result in resist patterns with tapered or T-top shapes, making it difficult to achieve favorable rectangular formability.
Innovation Solution
A positive resist composition incorporating a resin component with acid-dissociable, dissolution-inhibiting groups and an acid generator that generates acid upon exposure, allowing for increased alkali solubility and enabling the formation of resist patterns with improved shape fidelity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional chemically amplified positive resist composition is used, then high resolution and sensitivity are achieved, but the resist pattern develops tapered or T-top shape with poor rectangularity
Solution Approach 1:
The invention changes the chemical parameters of the resist composition by introducing a specific dissolution inhibitor (compound of formula 1) with particular molecular structure characteristics. This compound has a glass transition temperature of -50°C or lower and specific functional groups that prevent unwanted side reactions, thereby improving pattern rectangularity while maintaining high resolution and sensitivity
Solution Approach 2:
The invention creates a composite resist system combining the base resin, acid generator, and the specifically designed dissolution inhibitor compound. This composite formulation works synergistically to prevent tapered and T-top shapes while achieving favorable rectangular patterns, resolving the contradiction between pattern shape and manufacturing precision
2Productivity
If increased amount of acid generator is used to improve sensitivity, then exposure sensitivity increases, but line edge roughness increases and pattern shape deteriorates
Solution Approach 1:
The dissolution inhibitor compound acts as an intermediary that mediates between the acid generator and the base resin. It suppresses unwanted side reactions and maintains system stability even when acid generator amount is increased, allowing high sensitivity to be achieved without excessive line edge roughness or pattern shape deterioration
Solution Approach 2:
By changing the chemical environment through the dissolution inhibitor, the system can tolerate higher acid generator concentrations without suffering from increased line edge roughness. The inhibitor modifies the reaction dynamics to maintain pattern quality while enabling higher sensitivity through increased acid generator content
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition allows for the formation of resist patterns with excellent rectangularity and reduced line edge roughness, maintaining shape integrity even with increased amounts of acid generator components, while enhancing resolution and heat resistance.
Implementation Method 1
an acid generator (PAG) which generates an acid upon exposure
Data Source
AI summary
A positive resist composition includes a resin component (A), and an acid generator component (B) which generates an acid upon exposure and includes an acid generator (B1) represented by general formula (B1):(wherein R51 represents a straight chain, branched chain, or cyclic alkyl group, or a straight chain, branched chain, or cyclic fluorinated alkyl group; R52 represents a hydrogen atom, a hydroxyl group, a halogen atom, a straight chain, branched chain, or cyclic alkyl group, a straight chain or branched chain halogenated alkyl group, or a straight chain or branched chain alkoxy group; R53 represents an aryl group which may include a substituent; and n represents an integer from 1 to 3).