Resist Composition for Pattern Line Edge Roughness Control
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Solution Overview
Problem
Conventional resist compositions fail to adequately address pattern line edge roughness (LER) and resolution issues.
Innovation Solution
A resist composition comprising a resin with specific structural units and an acid generator, which becomes soluble in alkali aqueous solution upon acid action, is developed. This composition includes a resin with structural units represented by formula (I) and an acid generator represented by formula (II), along with optional solvents and additives, and is processed through application, drying, exposure, heating, and development steps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used, then basic resist functionality is maintained, but pattern line edge roughness (LER) and resolution are not satisfied
Solution Approach 1:
The patent changes the chemical parameters of the resist composition by introducing a specific polymer with carboxyl groups and using particular acid generators (sulfonium or iodonium salts). This chemical parameter modification enables the resin to become soluble in alkali aqueous solution after acid action, directly improving pattern line edge roughness and resolution while maintaining reliable resist pattern formation.
Solution Approach 2:
The patent creates a composite resist system combining a polymer containing structural units with formula (I) (which becomes soluble in alkali after acid action) with an acid generator. This composite material approach integrates multiple functional components - the polymer provides the solubility transformation capability while the acid generator enables the chemical reaction, together achieving both improved precision and reliability.
2Manufacturing precision
If resin with structural unit (I) is used to improve solubility control, then pattern quality improves, but dry etching resistance and adhesion must be maintained
Solution Approach 1:
The patent applies local quality by having the polymer contain structural units with formula (I) that provide acid-responsive solubility change in specific regions, while the overall resist composition maintains dry etching resistance and adhesion properties. The carboxyl-containing polymer provides localized solubility control where needed without compromising the bulk resist strength.
Solution Approach 2:
The patent modifies physical-chemical parameters by selecting specific polymer structures with carboxyl groups and controlling their content (5-50 mass%) in the resist composition. This parameter optimization allows the resin to achieve adequate solubility control for pattern formation while maintaining sufficient dry etching resistance and substrate adhesion.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition improves pattern line edge roughness and resolution, enhancing the production of resist patterns with improved dry etching resistance and adhesiveness to substrates.
Implementation Method 1
an acid generator having an acid labile group
Implementation Method 2
a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid
Implementation Method 3
heating the exposed composition layer
Data Source
AI summary
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator having an acid labile group,wherein R1, A1, A13, A14, X12 are defined in the specification.