Resist Composition for Line Edge Roughness Control
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Solution Overview
Problem
Existing resist compositions fail to produce resist patterns with satisfactory line edge roughness (LER), a critical parameter in microfabrication processes.
Innovation Solution
A resist composition comprising a compound represented by formula (I), a resin with specific acid-labile groups, and an acid generator, along with a quencher generating an acid of lower acidity, is applied, dried, exposed, heated, and developed to form a resist pattern with improved LER.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If existing resist compositions are used, then the manufacturing process is simple, but the line edge roughness (LER) is not satisfactory
Solution Approach 1:
The patent uses a composite resist composition containing a polymer with carboxyl groups (5-50 mass%), compound (I) (0.01-10 mass%), and acid generator (1-50 mass%). This composite approach combines multiple materials with specific functions: the polymer provides base structure and solubility, compound (I) provides the specific chemical structure for improved LER, and the acid generator enables photo-induced decomposition. The synergistic combination achieves satisfactory LER while maintaining reasonable manufacturing complexity.
Solution Approach 2:
The patent introduces compound (I) with specific local structural features (R1 as halogen or alkyl fluoride, m1 as 1-5, R2 as acid-labile group) into the resist composition. This compound contains specific functional groups and structural characteristics that locally enhance the resist's performance. The localized introduction of this specially designed compound improves line edge roughness without requiring complete redesign of the entire resist system.
2Manufacturing precision
If a resist composition with specific structural units is used, then line edge roughness improves, but the composition complexity increases
Solution Approach 1:
The patent specifies precise parameter ranges for the resist composition: polymer content (5-50 mass%), compound (I) content (0.01-10 mass%), acid generator content (1-50 mass%), and structural parameters of compound (I) (m1: 1-5, n1: 0-10, n1': 0-3). By optimizing these parameters within defined ranges, the patent achieves improved LER while controlling composition complexity. The parameter optimization allows systematic tuning of resist performance without exhaustive structural complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The described resist composition effectively produces resist patterns with enhanced line edge roughness, addressing the limitations of existing technologies by incorporating a compound, resin, and acid generator with specific structural units and a quencher to improve pattern quality.
Implementation Method 1
an acid generator, the resin having a first acid-labile group
Implementation Method 2
a resin having a first acid-labile group and an acid generator, the resin having a first acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2)
Data Source
AI summary
Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):