Resist Composition for Lithography Coating Uniformity
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Solution Overview
Problem
Current resist compositions face challenges in achieving uniform coating and maintaining lithography properties as the solubility of the resist film in organic solvents deteriorates, leading to non-uniformity and pattern defects during the miniaturization of resist patterns in advanced lithography techniques.
Innovation Solution
A resist composition comprising a base component that changes solubility under acid action, an acid-generator component, and an organic solvent containing a specific compound, which generates acid upon exposure to form a resist pattern with improved solubility contrast in both alkali and organic developing solutions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If the solubility of the resist film in organic solvents is improved, then the coating uniformity is improved, but the solubility contrast in developing solutions deteriorates
Solution Approach 1:
The patent changes the chemical parameters of the organic solvent by introducing a specific compound with a sulfur atom bonded to an aromatic ring and a hydroxyl group. This parameter change allows the solvent to simultaneously improve coating uniformity while maintaining solubility contrast in developing solutions, resolving the technical contradiction.
Solution Approach 2:
The patent creates a composite solvent system by combining the specific organic solvent compound with other components. This composite approach enables the solvent to achieve both improved coating uniformity and maintained solubility contrast, as the specific compound works synergistically with other components to resolve the contradiction.
2Measurement precision
If the wavelength of the exposure light source is shortened, then the resolution is improved, but the sensitivity to the exposure light source deteriorates
Solution Approach 1:
The patent changes the chemical composition parameters of the resist material to include specific base resins and organic solvents that are optimized for short-wavelength exposure. This parameter change enables the resist to maintain high sensitivity while achieving high resolution with short-wavelength light sources.
Solution Approach 2:
The patent introduces an acid generator as an intermediary component that mediates between the exposure light and the base resin. The acid generator absorbs the exposure energy and triggers the solubility change in the base resin, enabling high sensitivity response to short-wavelength exposure while maintaining high resolution.
3Quantity of substance
If the polarity of the base resin is increased, then the solubility in alkali developing solution is improved, but the solubility in organic solvent deteriorates
Solution Approach 1:
The patent changes the polarity parameter of the base resin by selecting specific resin types with controlled polarity. This parameter change enables the resin to have sufficient solubility in alkali developing solutions while maintaining adequate solubility in the specific organic solvent, resolving the contradiction between these two solubility requirements.
Solution Approach 2:
The patent introduces the specific organic solvent compound as an intermediary that mediates between the base resin and the developing solutions. This intermediary solvent modifies the solubility characteristics to achieve both good solubility in alkali solutions and adequate solubility in organic phases, resolving the contradiction.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition ensures excellent applicability, resolution, and lithography properties by maintaining solubility contrast, preventing non-uniformity and pattern defects, and enabling the formation of high-quality resist patterns in advanced lithography processes.
Implementation Method 1
an acid-generator component (B) which generates acid upon exposure
Data Source
AI summary
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure and an organic solvent component (S), the organic solvent component (S) containing an organic solvent (S1) including a compound represented by general formula (s-1) shown below and the acid-generator component (B) being an onium salt (in the formula, X represents a single bond or an alkylene group of 1 to 3 carbon atoms; and n represents an integer of 0 to 3).