Resist Composition With Polymer-Bound Acid Generator for Low LWR
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Solution Overview
Problem
Existing resist compositions face challenges in achieving high sensitivity, low line width roughness (LWR), and critical dimension uniformity (CDU) due to acid diffusion, which affects the formation of fine patterns in microelectronic devices.
Innovation Solution
A resist composition incorporating a base polymer with repeat units having a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation with a triple bond-bearing tertiary ester type acid labile group, which functions as an acid generator, enhances dissolution contrast and suppresses acid diffusion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If acid diffusion is suppressed by reducing temperature and/or time of post-exposure bake, then resolution is improved, but sensitivity and contrast are drastically reduced
Solution Approach 1:
The invention changes the chemical parameters of the acid generator by using a polymer-bound acid generator with specific molecular weight and structure. This modifies the acid diffusion characteristics without requiring extreme reductions in PEB temperature or time, thereby maintaining both resolution and sensitivity
Solution Approach 2:
The invention uses a composite resist composition comprising a polymer-bound acid generator combined with specific base polymers. This composite structure allows controlled acid diffusion while maintaining high sensitivity and contrast, resolving the trade-off between resolution and sensitivity
2Manufacturing precision
If acid diffusion is suppressed by using a polymer-bound acid generator, then resolution is improved, but dissolution contrast may be insufficient
Solution Approach 1:
The invention combines a polymer-bound acid generator with specific base polymers (polycarboxylic acid or phenolic resin) to create a composite resist system. This composite structure ensures both controlled acid diffusion for high resolution and sufficient dissolution contrast for reliable pattern formation
Solution Approach 2:
The invention applies different functional components in specific proportions within the resist composition. The polymer-bound acid generator provides localized acid generation with controlled diffusion, while the base polymer provides dissolution contrast, with each component optimized for its specific function
3Reliability
If a base polymer of carboxy generation type is used to enhance dissolution contrast, then alkaline solubility is improved, but acid diffusion control becomes more challenging
Solution Approach 1:
The invention changes the parameters of the acid generator (using polymer-bound type with specific molecular weight) to compensate for the increased acid diffusion tendency of carboxy-generation base polymers. This allows use of high-contrast base polymers while maintaining acid diffusion control through the unique properties of the polymer-bound acid generator
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition improves LWR and CDU, providing a resist with high sensitivity and a wide process margin, suitable for forming fine patterns in microelectronic devices.
Implementation Method 1
a base polymer comprising repeat units (a) having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation
Implementation Method 2
a sulfonium cation having a triple bond-bearing tertiary ester type acid labile group
Data Source
AI summary
A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having an acid labile group of triple bond-bearing tertiary ester type as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.