Resist Composition Mask Error Factor Reduction via Acid-Labile Units
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Solution Overview
Problem
Conventional resist compositions with specific resin structures fail to adequately address mask error factors in resist patterns, leading to suboptimal performance.
Innovation Solution
A resist composition comprising a resin with a structural unit represented by formula (I), an acid generator, and a compound represented by formula (II), which is insoluble in alkali aqueous solutions but becomes soluble upon acid action, along with a solvent, applied in a method involving application, drying, exposure, and heating for pattern development.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional resist composition containing a resin with specific structural units is used, then the resist composition can be processed with standard materials, but the mask error factor (MEF) of the obtained resist pattern is not satisfied
Solution Approach 1:
The patent uses a composite resin structure combining multiple structural units (formula I units with acid-labile groups and formula II units with acid-stable groups) to achieve both improved mask error factor and maintainable processability. This composite approach allows the resin to exhibit both the desired pattern accuracy and compatibility with standard manufacturing materials.
Solution Approach 2:
The patent modifies the chemical structure parameters of the resin by introducing specific structural units with defined molecular weights and ratios. By controlling the proportion of acid-labile to acid-stable structural units and adjusting molecular weight ranges, the composition achieves optimal balance between mask error factor and ease of manufacture.
2Manufacturing precision
If a resin with acid-labile groups is used to improve pattern accuracy, then the mask error factor improves, but the resin becomes sensitive to alkali aqueous solutions
Solution Approach 1:
The patent applies local quality by having different regions of the resin structure respond differently to alkali treatment. The acid-labile structural units (formula I) provide pattern accuracy through localized acid sensitivity, while the acid-stable structural units (formula II) provide alkali resistance in their local regions. This spatial differentiation of functional properties resolves the contradiction between pattern accuracy and alkali sensitivity.
Solution Approach 2:
The acid-stable structural units act as intermediaries that protect the acid-labile units from alkali degradation. These stable units create a protective framework that allows the acid-labile units to function for pattern formation without being compromised by alkali sensitivity, thus mediating between the conflicting requirements.
3Manufacturing precision
If the resin contains specific structural units to reduce mask error, then the resist pattern quality improves, but the development process becomes more complex
Solution Approach 1:
The patent segments the resin structure into distinct functional units: acid-labile structural units for pattern formation and acid-stable structural units for process stability. This segmentation allows each unit to perform its specific function independently, simplifying the overall development process while maintaining high pattern quality through the coordinated action of these segmented components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition effectively improves the mask error factor in resist patterns, enhancing the accuracy and quality of the resist pattern formation process.
Implementation Method 1
a compound represented by the formula (II)... which is insoluble in alkali aqueous solutions but becomes soluble upon acid action... exposing the composition layer... heating the exposed composition layer
Implementation Method 2
an acid generator... exposing the composition layer... heating the exposed composition layer
Implementation Method 3
a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid
Implementation Method 4
heating the exposed composition layer... developing the heated composition layer
Data Source
AI summary
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II),wherein R1, A1, A13, A14, X12, R23 and ring W21 are defined in the specification.