Resist Composition for Lithography Roughness and Mask Reproducibility
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Solution Overview
Problem
Current resist compositions struggle to achieve both reduced roughness and excellent mask reproducibility in lithography techniques, particularly as pattern miniaturization advances, with existing combinations of resins and acid generators failing to meet high requirements for resolution and pattern shape.
Innovation Solution
A resist composition is developed that includes a base component with a polymeric compound containing an acid decomposable group and a lactone or carbonate-containing cyclic group, combined with an acid generator having a nitrogen atom for proton acceptor properties, which generates acid upon exposure, altering solubility in developing solutions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions use existing combinations of resins and acid generators, then basic lithography functionality is achieved, but both roughness reduction and mask reproducibility cannot be achieved simultaneously
Solution Approach 1:
The patent applies composite materials by combining a specific base resin (polymer compound with lactone or carbonate cyclic groups) with a particular acid generator (sulfonate compound containing nitrogen atom with proton acceptor property). This composite resist composition enables simultaneous achievement of reduced roughness and excellent mask reproducibility, resolving the technical contradiction between these two parameters.
2Measurement precision
If pattern miniaturization is pursued to achieve higher resolution, then lithography resolution is improved, but requirements for resist composition become more stringent and harder to satisfy
Solution Approach 1:
The patent applies parameter changes by modifying the chemical structure parameters of the resist composition - specifically using a base resin with lactone or carbonate cyclic groups and a sulfonate acid generator with nitrogen proton acceptor sites. These parameter changes enable the resist to meet the stringent requirements for high-resolution pattern miniaturization while maintaining compositional simplicity.
3Productivity
If acid generator components generate acid upon exposure to improve solubility change, then lithography sensitivity is enhanced, but control over solubility in developing solutions becomes more critical
Solution Approach 1:
The patent applies local quality by designing the acid generator with specific local chemical characteristics - a sulfonate compound containing a nitrogen atom with proton acceptor property. This localized chemical structure enables controlled acid generation upon exposure while maintaining precise solubility control in the developing solution, resolving the contradiction between sensitivity enhancement and solubility control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This composition enables the formation of resist patterns with reduced roughness and improved mask reproducibility, enhancing lithography properties such as resolution and pattern shape.
Implementation Method 1
an acid generator component (B) which generates acid upon exposure
Data Source
AI summary
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resist composition including: a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid generator component (B) which generates an acid upon exposure, the base component (A) including a polymeric compound (A1) having a structural unit (a0) containing an acid decomposable group that exhibits increased polarity by the action of acid and a lactone-containing cyclic group, an —SO2— containing cyclic group or a carbonate-containing cyclic group, and the acid generator component (B) including an acid generator (B1) containing a compound having a nitrogen atom exhibiting a proton acceptor property and an acid generating site capable of generating an acid upon exposure in the same molecule thereof.