Radiation-Sensitive Resist Composition for Rectangular Pattern Profiles
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Solution Overview
Problem
Existing actinic ray-sensitive or radiation-sensitive resin compositions fail to produce patterns with a rectangular shape, exhibiting non-rectangular cross-sectional shapes due to imbalances in pattern line widths.
Innovation Solution
A resin composition comprising a compound that generates an acid upon irradiation and a resin with increased polarity through acid decomposition, featuring specific structural moieties and acid dissociation constants, forming a pattern with a rectangular shape.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Shape
If a conventional acid generator and resin combination is used, then the resist composition can form patterns, but the patterns exhibit non-rectangular cross-sectional shapes with excessive line width ratios
Solution Approach 1:
The patent modifies the chemical parameters of the acid generator by selecting specific compounds with defined acid dissociation constants (Ka1 and Ka2) and structural moieties. This changes the acid generation characteristics to minimize diffusion and improve pattern rectangularization, directly addressing the shape and precision contradiction
Solution Approach 2:
The patent creates a composite resist system by combining specifically selected acid generators (with particular structural moieties X and Y) and resins (with specific repeating units). This composite approach optimizes the interaction between components to achieve better pattern shape control and rectangularization
2Shape
If the acid diffusion is not controlled, then the development process is simple, but the pattern shape becomes non-rectangular with poor definition
Solution Approach 1:
The patent controls acid diffusion by selecting acid generators with specific acid dissociation constants and structural characteristics. This parameter optimization limits the diffusion distance of generated acids, thereby defining sharper pattern boundaries and improving cross-sectional shape definition
Solution Approach 2:
The patent introduces specific resin components with repeating units that act as intermediaries between the acid generator and the pattern formation process. These resins modulate acid diffusion and enhance the interaction with generated acids to improve pattern definition
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves patterns with improved rectangularization by minimizing acid diffusion and enhancing interaction with the resin, resulting in well-defined cross-sectional shapes.
Implementation Method 1
a compound that generates an acid upon irradiation with actinic rays or radiation
Implementation Method 2
a resin of which polarity increases through decomposition by an action of an acid
Data Source
AI summary
Provided is an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having a good shape can be obtained. Also provided is a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. Also provided is a compound which can be suitably used in the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, an acid-decomposable resin having a weight-average molecular weight of 30,000 or less, and a solvent, and the compound that generates an acid upon irradiation with actinic rays or radiation includes a compound (I).