Radiation-Sensitive Resist Composition for Stable High-Resolution Patterning

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Solution Overview

Problem

There is a demand for resist compositions with higher resolution and better process margin, particularly in semiconductor fabrication, where variations in post-exposure bake (PEB) temperature can affect pattern formation.

Innovation Solution

An actinic ray-sensitive or radiation-sensitive resin composition containing a resin with an acid-decomposable group and a nonionic aminoxyl radical with a molecular weight of 300 or more, which provides high resolution and low PEB temperature dependence.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional resist compositions are used, then basic pattern formation is achieved, but resolution is insufficient and PEB temperature dependence is high

Engineering Contradiction:

ImproveresolutionVSAvoidPEB temperature dependence

Core Design Contradiction:

Manufacturing precisionVSReliability

Solution Approach 1:

The patent changes the chemical parameters of the resist composition by introducing a specific compound with a nitroxyl radical group and iodine atom. This compound acts as a radical trap that suppresses radical reactions during PEB, thereby reducing the sensitivity to temperature variations while maintaining high resolution through its impact on the resist's chemical structure and reaction dynamics.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite resist composition by combining conventional resist components with a novel compound containing a nitroxyl radical group and iodine atom. This composite structure enables the resist to achieve both high resolution and low PEB temperature dependence by synergistically combining the functions of different components, particularly the radical-trapping capability of the added compound.

Inventive Principle:

Principle #40Composite materials

2Adaptability or versatility

If the PEB temperature is varied, then process flexibility is improved, but pattern formation quality deteriorates due to high temperature dependence

Engineering Contradiction:

Improveprocess flexibilityVSAvoidpattern formation quality

Core Design Contradiction:

Adaptability or versatilityVSManufacturing precision

Solution Approach 1:

The patent applies preliminary anti-action by incorporating a compound with radical-trapping capability that preemptively counteracts the harmful effects of radical reactions during PEB. This compound suppresses unwanted chemical reactions before they can significantly impact pattern quality, thereby maintaining manufacturing precision even when PEB temperature varies within a flexible range.

Inventive Principle:

Principle #9Preliminary anti-action

3Manufacturing precision

If higher resolution is pursued, then manufacturing precision is improved, but process margin decreases due to increased sensitivity

Engineering Contradiction:

ImproveresolutionVSAvoidprocess margin

Core Design Contradiction:

Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The patent introduces an intermediary compound containing a nitroxyl radical group and iodine atom that mediates the chemical reactions during exposure and development. This intermediary acts as a buffer that stabilizes the resist's behavior, allowing high resolution to be achieved while maintaining a wider process margin by reducing sensitivity to variations in exposure and development conditions.

Inventive Principle:

Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition achieves high resolution and reduced sensitivity to PEB temperature variations, enhancing the process margin in pattern formation.

Implementation Method 1

containing (C) a nonionic aminoxyl radical having a molecular weight of 300 or more and not including an iodine atom

Methodology Applied

Scientific EffectRadical trap:

Implementation Method 2

a resin including a repeating unit having a group which is decomposed by action of an acid to provide increased polarity

Methodology Applied

Scientific EffectAcid decomposition:

Data Source

PatentUS20260003270A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device

Publication Date: 2026.01.01 FUJIFILM CORP

AI summary

An actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin including a repeating unit having a group which is decomposed by action of an acid to provide increased polarity, and (C) a nonionic aminoxyl radical having a molecular weight of 300 or more and not including an iodine atom, an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for producing an electronic device which uses the actinic ray-sensitive or radiation-sensitive composition.