Resist Composition for High-Accuracy Plated Molded Articles
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Solution Overview
Problem
Conventional resist compositions used in plating treatments lack accuracy in forming high-quality resist patterns and plated molded articles.
Innovation Solution
A resist composition comprising a compound with a quinone diazide sulfonyl group, a resin with an acid-labile group, an alkali-soluble resin, and an acid generator, which enhances the accuracy of resist patterns and plated molded articles by controlling solubility and crosslinking properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional resist composition is used, then the plating treatment can be performed, but the accuracy of the resist pattern and plated molded article is insufficient
Solution Approach 1:
The patent uses a composite resist composition containing a compound with a quinone diazide sulfonyl group, a resin with acid-labile groups, an alkali-soluble resin, and an acid generator. This composite formulation provides both high manufacturing precision through controlled solubility changes and sufficient reliability by maintaining resistance to plating treatments and developers
Solution Approach 2:
The patent controls the solubility parameters of the resist composition by selecting specific compounds with quinone diazide sulfonyl groups and resins with acid-labile groups. The acid generator enables controlled chemical changes during exposure, transforming the resist from insoluble to soluble in specific regions, achieving high pattern accuracy while maintaining overall structural integrity during plating
2Manufacturing precision
If the resist pattern is made more resistant to plating treatment, then the accuracy improves, but the complexity of the resist composition increases
Solution Approach 1:
The compound with the quinone diazide sulfonyl group serves multiple functions: it acts as a light-sensitive component for pattern formation, provides structural backbone for the resist, and enables controlled solubility changes. The acid-labile groups in the resin similarly provide both pattern definition and controlled dissolution properties, reducing the need for additional specialized additives and simplifying the overall composition
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves high accuracy in forming resist patterns and plated molded articles by improving resistance to plating treatments and developers, leading to enhanced precision and quality.
Implementation Method 1
a compound (I) having a quinone diazide sulfonyl group, a resin comprising a structural unit having an acid-labile group (A1), an alkali-soluble resin (A2) and an acid generator (B)
Implementation Method 2
a resin comprising a structural unit having an acid-labile group (A1)
Data Source
AI summary
The present invention provides a resist composition which has sufficient resistant to a plating treatment and is capable of forming a resist pattern with high accuracy. The present invention also provides a method for producing a resist pattern using the resist composition, and a method for producing a plated molded article using the resist pattern. The present invention relates to a resist composition comprising a compound (I) having a quinone diazide sulfonyl group, a resin comprising a structural unit having an acid-labile group (A1), an alkali-soluble resin (A2) and an acid generator (B); a method for producing a resist pattern using the resist composition; and a method for producing a plated molded article using the resist pattern.