Resist Composition Reducing Line Edge Roughness
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Solution Overview
Problem
Conventional resist compositions fail to consistently achieve satisfactory pattern line edge roughness (LER) in resist patterns.
Innovation Solution
A resist composition comprising a resin with specific structural units, an acid generator, and a compound, applied in a process involving application, drying, exposure, and development, which includes a resin insoluble in alkali aqueous solution but becomes soluble upon acid action, and a solvent to produce a resist pattern with improved edge roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used, then basic resist pattern formation is achieved, but pattern line edge roughness (LER) is not satisfactory
Solution Approach 1:
The patent changes the chemical parameters of the resist composition by introducing a specific compound with formula (II) containing carbonyl groups that can interact with the acid-generated regions. This compound has specific molecular weight (100-5000) and structural parameters (R3, R4, m', n' values) that are optimized to control the dissolution behavior and reduce line edge roughness while maintaining pattern consistency
Solution Approach 2:
The patent creates a composite resist system by combining three key components: the resin with structural units (I) and (II), the acid generator, and the specific compound of formula (II). This composite material works synergistically where the resin provides structural integrity, the acid generator enables pattern definition, and the compound of formula (II) controls dissolution to reduce LER, achieving both precision and reliability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition effectively reduces pattern line edge roughness, enhancing the quality and consistency of resist patterns by utilizing a resin that remains insoluble in alkali until acted upon by acid, thereby improving the resist pattern's resolution and dry etching resistance.
Implementation Method 1
a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid
Implementation Method 2
an acid generator... exposing the composition layer; (4) heating the exposed composition layer
Data Source
AI summary
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator,wherein R1, A1, A13, A14, X12, R3, R4, m′ and n′ are defined in the specification.