Resist Composition for High Resolution and Etch Tolerance
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Solution Overview
Problem
Current resist compositions with acid-labile groups and acid generators face challenges in achieving optimal resolution and dry-etching tolerance, particularly in producing resist patterns with deep focus and reduced defects.
Innovation Solution
A resist composition comprising a resin with specific structural units, including a sulfonyl group-containing sultone ring and an acid-labile group, along with an acid generator, which is applied to a substrate, dried, exposed, and developed to form a resist pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a resin with acid-labile groups and acid generator is used in resist composition, then the resist can be developed after exposure, but the resolution and dry-etching tolerance cannot be optimized simultaneously
Solution Approach 1:
The patent divides the resist composition into functionally distinct segments: resin (A1) containing sulfonyl groups and fluorinated groups for dry-etching tolerance, and resin (A2) containing acid-labile groups for resolution. This segmentation allows each component to independently contribute its specialized function without compromising the other, resolving the contradiction between resolution and dry-etching tolerance
Solution Approach 2:
The patent creates a composite resist composition by combining two不同类型的树脂：resin (A1) with sulfonyl and fluorinated groups, and resin (A2) with acid-labile groups. This composite material approach enables the resist to simultaneously achieve high resolution through resin (A2)'s acid-labile groups and high dry-etching tolerance through resin (A1)'s sulfonyl and fluorinated groups
2Manufacturing precision
If conventional resist composition is used, then the process is simple, but the depth of focus and defect reduction are insufficient
Solution Approach 1:
The patent applies local quality by giving different functional properties to different components within the resist composition. Resin (A1) is specifically designed with sulfonyl and fluorinated groups to provide dry-etching tolerance and depth of focus enhancement, while resin (A2) contains acid-labile groups for high-resolution patterning. This localized functional differentiation enables the complex composition to achieve superior depth of focus and defect reduction
3Measurement precision
If resist composition is optimized for high resolution, then pattern definition improves, but dry-etching tolerance deteriorates
Solution Approach 1:
The patent introduces resin (A1) containing sulfonyl groups and fluorinated groups as an intermediary component that mediates between the high-resolution patterning function of resin (A2) and the protection against etching damage. The sulfonyl groups provide polar interactions for pattern definition, while the fluorinated groups provide chemical inertness for etching resistance, acting as a bridge between these conflicting requirements
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves improved resolution and dry-etching tolerance, enabling the production of resist patterns with enhanced depth of focus and reduced defects.
Implementation Method 1
a resin having an acid-labile group and an acid generator
Data Source
AI summary
1. A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having a sulfonyl group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator.wherein R3 represents a hydrogen atom or a methyl group, and R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.