Resist Composition Salt for Line Edge Roughness
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Solution Overview
Problem
Existing resist compositions struggle to produce resist patterns with improved line edge roughness (LER).
Innovation Solution
A resist composition comprising a salt represented by formula (I), a quencher, a resin with an acid-labile group, and an acid generator, where the salt is used in a process involving application, drying, exposure, heating, and development to form a resist pattern with enhanced line edge roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional salts are used in resist composition, then the resist pattern can be formed, but the line edge roughness (LER) is poor
Solution Approach 1:
The patent modifies the chemical structure of the salt by changing parameters such as introducing specific functional groups (carboxyl, sulfonic acid, phosphonic acid groups) and adjusting molecular weight and purity parameters to achieve improved line edge roughness while maintaining reliable pattern formation
Solution Approach 2:
The patent creates a composite resist composition by combining the modified salt with specific resin components and acid generators, where the synergistic interaction between these materials produces superior line edge roughness and pattern quality compared to conventional single-component systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition effectively produces a resist pattern with improved line edge roughness, addressing the limitations of existing technologies.
Implementation Method 1
a resin including a structural unit having an acid-labile group, and an acid generator
Data Source
AI summary
Disclosed are a salt represented by formula (I) and a resist composition including the same: