Resist Composition Stability Using Oxime Sulfonate Acid Generator
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Solution Overview
Problem
Chemically amplified resist compositions used in semiconductor manufacturing face challenges with the stability of resist patterns and the occurrence of developing defects, particularly when using onium salt-based acid generators, which can result in footing issues and reduced pattern rectangular formability, and oxime sulfonate-based acid generators, which have stability and defect problems.
Innovation Solution
A resist composition incorporating an oxime sulfonate-based acid generator, a resin component with alkali solubility changes, an amine compound with 5-12 carbon atoms, and an organic acid dissolved in methyl n-amyl ketone, along with a thermal narrowing process to improve pattern stability and reduce defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If onium salt-based acid generator is used, then acid-generating capability is improved, but pattern shape stability deteriorates due to footing formation
Solution Approach 1:
The patent introduces an amine compound as an intermediary substance that mediates between the onium salt-based acid generator and the resin component. The amine compound reacts with the generated acid to form a salt, thereby moderating the acid's direct action on the resin and preventing footing formation while maintaining the high acid-generating capability of the onium salt-based acid generator.
Solution Approach 2:
The patent changes the chemical parameters of the resist composition by adding specific amine compounds with controlled molecular weights and structures. This parameter change modifies the acid-base interaction dynamics, allowing the system to maintain high acid generation while achieving better pattern shape stability through controlled salt formation.
2Shape
If oxime sulfonate-based acid generator is used, then pattern shape is improved, but stability over time deteriorates and developing defects occur
Solution Approach 1:
The patent creates a composite resist composition system that combines oxime sulfonate-based acid generator with specifically selected amine compounds and resin components. This composite formulation synergistically improves both pattern shape and stability over time, overcoming the limitations of individual components.
Solution Approach 2:
The amine compound serves as a mediator that stabilizes the resist composition over time by controlling the acid-base reactions. It prevents premature reactions and maintains composition stability during storage, while also contributing to reduced developing defects through controlled interaction with the generated acid.
3Manufacturing precision
If chemically amplified resist composition is used, then resolution is improved, but developing defects increase
Solution Approach 1:
The amine compound acts as a mediator that reduces developing defects by controlling the acid distribution and reaction kinetics in the chemically amplified resist system. It prevents excessive acid accumulation that leads to defects while maintaining the high resolution capabilities of the chemically amplified process.
Solution Approach 2:
The patent modifies the chemical parameters of the resist composition by incorporating amine compounds with specific properties (molecular weight, structure). These parameter changes optimize the acid-base interaction to reduce developing defects while preserving the high resolution achieved through chemical amplification.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed resist composition enhances the stability of resist patterns over time and reduces developing defects, achieving improved dimensional stability and resolution, as evidenced by reduced dimensional differences and defect counts in pattern formation.
Implementation Method 1
an acid generator that generates acid upon exposure
Implementation Method 2
a base resin that exhibits changed alkali solubility under the action of acid
Implementation Method 3
all dissolved in an organic solvent (C) containing methyl n-amyl ketone
Implementation Method 4
conducting PEB (post exposure baking), and performing alkali developing to form the resist pattern
Data Source
AI summary
A resist composition is obtained by dissolving a resin component (A) that exhibits changed alkali solubility under the action of acid, an oxime sulfonate-based acid generator (B), an amine compound (D) containing at least one alkyl group of 5 to 12 carbon atoms, and an organic acid (E), in an organic solvent (C) containing methyl n-amyl ketone, wherein the component (E) is a dibasic acid.