Resist Composition for High-Resolution Trench and Hole Patterns
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Solution Overview
Problem
Conventional resist materials face challenges in achieving excellent lithography properties, particularly in forming high-resolution resist patterns for trench and hole patterns, with line collapse issues in negative-tone solvent developing processes.
Innovation Solution
A resist composition comprising a base component with a polymeric compound containing specific structural units that change solubility under acid action, allowing for use in both alkali developing and negative-tone solvent developing processes, reducing line collapse and improving pattern resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist materials are used for trench and hole pattern formation, then the lithography process can be completed, but line collapse occurs and pattern resolution is insufficient
Solution Approach 1:
The patent modifies the chemical composition parameters of the resist material by incorporating specific compounds ( compounds (1) and (2)) with defined molecular structures and ratios. This changes the solubility and development characteristics of the resist, enabling high-resolution pattern formation without line collapse in both alkali and solvent developing processes
Solution Approach 2:
The patent creates a composite resist system by combining multiple components: compound (1) containing specific functional groups, compound (2) with complementary properties, and optional additives. This composite formulation achieves synergistic effects that prevent line collapse while maintaining excellent pattern resolution across different development methods
2Adaptability or versatility
If a resist composition is designed for alkali developing process, then good pattern formation is achieved, but it cannot be used for negative-tone solvent developing process
Solution Approach 1:
The patent designs a universal resist composition that functions effectively in both alkali developing and negative-tone solvent developing processes. The compound (1) contains functional groups that provide appropriate solubility characteristics for both development types, while compound (2) enhances this multi-functionality. This allows the same resist material to be used across different process flows without sacrificing pattern formation quality in either method
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition enables the formation of high-resolution resist patterns with reduced line collapse, enhancing lithography properties and pattern quality in both alkali and solvent developing processes.
Implementation Method 1
an acid-generator component (B) which generates acid upon exposure
Implementation Method 2
a base component (A) which exhibits changed solubility in a developing solution under the action of acid
Data Source
AI summary
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) including a structural unit (a0) represented by general formula (a0-1) and a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid (R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; W represents —COO—, a —CONH— group or a divalent aromatic hydrocarbon group; Y1 and Y2 represent a divalent linking group or a single bond; R′1 represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R′2 represents a monovalent aliphatic hydrocarbon group; and R2 represents an —SO2— containing cyclic group).