Resist Material Crosslinking for Resolution and Stability
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Solution Overview
Problem
Conventional resist materials face issues with insufficient crosslinking reaction during calcining, leading to incomplete pattern formation, acid diffusion, and storage stability problems due to the decomposition of acetal structures and unwanted crosslinking reactions.
Innovation Solution
A resist material comprising a polymer with hydroxy or carboxy groups, a vinyl ether crosslinker, a thermal acid generator, and a quencher, which promotes controlled crosslinking and acid generation to improve resolution, pattern shape, and storage stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If crosslinking is performed to increase molecular weight and reduce acid diffusion, then resolution and pattern stability improve, but storage stability deteriorates due to aggregation and unwanted crosslinking reactions
Solution Approach 1:
The patent applies preliminary crosslinking during the calcining process before lithography, forming a crosslinked structure in advance that prevents acid diffusion during subsequent exposure. This preliminary action allows the resist to maintain high molecular weight and structural integrity during storage while still enabling controlled acid generation and crosslinking decomposition during the actual lithography process, thus resolving the contradiction between pattern resolution and storage stability
Solution Approach 2:
The patent utilizes temperature parameter changes to control the crosslinking reaction. By performing crosslinking at elevated temperatures during calcining (typically 90-150°C), the system achieves sufficient crosslinking for pattern stability while the reversible nature of the crosslinking at lithography temperatures allows for controlled decomposition and acid generation, thereby maintaining both resolution and storage stability
2Strength
If crosslinking reaction proceeds during calcining to form high molecular weight structure, then pattern collapse is prevented, but crosslinking is insufficient leading to remained monomeric components that adversely affect lithographic performance
Solution Approach 1:
The patent employs a two-stage thermal processing approach: first, calcining at elevated temperatures to promote crosslinking and strengthen the pattern structure; second, lithography exposure at lower temperatures where the crosslinked structure decomposes controllably to generate acid for pattern formation. This periodic thermal action ensures sufficient crosslinking for pattern strength while enabling complete reaction to eliminate monomeric components that would otherwise degrade lithographic performance
3Productivity
If acid is added to promote crosslinking reaction, then crosslinking efficiency improves, but storage stability deteriorates due to unwanted crosslinking during solution storage
Solution Approach 1:
The patent performs crosslinking as a preliminary action during the calcining process rather than adding acid to promote crosslinking during storage. The thermal energy during calcining provides sufficient activation for crosslinking without requiring additional acid catalysts, thereby achieving efficient crosslinking while maintaining storage stability by avoiding premature crosslinking reactions during solution storage
Data Source
AI summary
Provided are: a resist material and patterning process having sensitivity, resolution, and dissolution contrast exceeding those of conventional positive-type resist materials, having reduced edge roughness and size variation, and having a good pattern shape after exposure. A resist material, including: (Ia) a polymer having a repeating unit (A) having a hydroxy group or a carboxy group; (II) a crosslinker having a structure represented by the following formula (1); (III) a thermal acid generator having a structure represented by the following formula (2); (IV) an organic solvent; and (V) a component to be decomposed by irradiation of active ray or radiation to generate an acid.