Resist Composition with Cyclic Carbonate for Low LER
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Solution Overview
Problem
Current resist compositions with acid-labile groups and acid generators face challenges in achieving optimal resolution and dry-etching tolerance, particularly in producing resist patterns with low line edge roughness (LER) and reduced defects.
Innovation Solution
A resist composition comprising a resin with specific structural units, including a cyclic carbonate and an acid-labile group, along with an acid generator, which is applied to a substrate, dried, exposed, and developed to form a resist pattern, enhancing resolution and dry-etching tolerance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a resin with acid-labile groups and acid generator is used in resist composition, then the resist can undergo chemical changes during exposure and development, but the line edge roughness increases and resolution deteriorates
Solution Approach 1:
The patent changes the chemical structure parameters of the resin by introducing specific structural units with fluorinated groups, cyclic carbonates, and alicyclic hydrocarbon groups. These parameter changes in molecular structure improve the resist's chemical resistance and reduce line edge roughness while maintaining pattern quality
Solution Approach 2:
The patent creates a composite resin system by combining multiple specific structural units within the same resin molecule. This composite structure integrates fluorinated groups for chemical resistance, cyclic carbonates for etch tolerance, and alicyclic groups for mechanical stability, resolving the contradiction between pattern quality and line edge roughness
2Ease of operation
If conventional resin structures are used to achieve good development properties, then the resist can be developed effectively, but dry-etching tolerance is insufficient
Solution Approach 1:
The patent modifies the resin's chemical parameters by incorporating cyclic carbonate structural units and fluorinated groups. These parameter changes enhance the resin's chemical inertness and crosslinking behavior, providing superior dry-etching tolerance while preserving good development properties through controlled acid-labile group placement
3Manufacturing precision
If the resist composition is optimized for high resolution, then finer patterns can be formed, but dry-etching tolerance decreases
Solution Approach 1:
The patent applies local quality by placing different functional groups in specific positions within the resin structure. Acid-labile groups are positioned for controlled decomposition during development, while fluorinated groups and cyclic carbonates are positioned to provide localized chemical resistance and etch tolerance, achieving both high resolution and dry-etching tolerance simultaneously
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition improves the resolution and dry-etching tolerance of resist patterns, reducing line edge roughness and defects, while maintaining excellent LER and pattern quality.
Implementation Method 1
a resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator
Data Source
AI summary
A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator:wherein R3 represents a hydrogen atom or a methyl group, R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, R1 represents a hydrogen atom or a methyl group, and L1 represents a single bond or a C1 to C18 divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and R2 represents a C3 to C18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C1 to C8 aliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to L1 has no aliphatic hydrocarbon group by which a hydrogen atom has been replaced.