Resist Composition with Cyclic Carbonate Units for Patterning
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Solution Overview
Problem
Current resist compositions for patterning do not achieve optimal resolution and dry-etching tolerance due to limitations in their chemical structure and composition, particularly in the presence of acid-labile groups and cyclic carbonates.
Innovation Solution
A resist composition incorporating a resin with specific structural units, including cyclic carbonates, acid-labile groups, and an acid generator, which enhances resolution and dry-etching tolerance by optimizing the chemical structure for improved patterning performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used, then manufacturing process is simple, but resolution and dry-etching tolerance are insufficient
Solution Approach 1:
The patent uses a composite resin system combining poly(cyclic carbonate-co-acid labile group-containing monomer) with specific structural units (formula I and II) to achieve both high resolution and dry-etching tolerance. The composite structure integrates cyclic carbonate units for resolution enhancement and specific alkyl groups for dry-etching resistance, resolving the contradiction between performance and structural simplicity.
Solution Approach 2:
The patent introduces specific structural units with localized functions: cyclic carbonate units (formula I) provide resolution enhancement through acid diffusion control, while structural units (formula II) with specific C1-C12 linear or branched alkyl groups provide dry-etching tolerance. This local functional differentiation resolves the contradiction by assigning specific regions of the polymer to specific performance requirements.
2Manufacturing precision
If acid-labile groups are incorporated to improve resolution, then patterning performance improves, but dry-etching tolerance deteriorates
Solution Approach 1:
The patent optimizes the parameters of acid-labile groups by specifying particular structural units (formula I with cyclic carbonate and formula II with specific alkyl chains). By changing the parameters of the acid-labile groups from conventional structures to these specific formulations, the patent achieves both improved patterning resolution and maintained dry-etching tolerance, resolving the traditional trade-off between these properties.
Solution Approach 2:
The patent creates a composite resin system where cyclic carbonate-containing units work synergistically with specific acid-labile group units (formula II). This composite approach allows the material to exhibit both high resolution (from cyclic carbonate units controlling acid diffusion) and high dry-etching tolerance (from the specific structural configuration), overcoming the limitation of conventional single-function resist materials.
3Manufacturing precision
If cyclic carbonate structural units are used to enhance resolution, then patterning capability improves, but chemical structure complexity increases
Solution Approach 1:
The patent segments the polymer structure into distinct functional units: cyclic carbonate units (formula I) for resolution enhancement and separate acid-labile group units (formula II) for patterning control. This segmentation allows each unit to perform its specific function independently, achieving high patterning capability while managing structural complexity through modular design rather than requiring a single complex structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition demonstrates improved resolution and dry-etching tolerance, effectively addressing the limitations of existing technologies by leveraging the specific structural units to enhance patterning capabilities.
Implementation Method 1
a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator
Data Source
AI summary
A resist composition which contains a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator:wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, g represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.