Resist and Etch Model Calibration Acceleration
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Solution Overview
Problem
Current resist and etch model calibration processes are time-consuming and computationally intensive, requiring extensive periods for template selection and model tuning, with repeated calculations and long turnaround times due to the vast parameter space and heavy computation load.
Innovation Solution
A method for accelerating calibration by iteratively defining and refining fabrication process model terms, using pre-calculated signals to generate predictions, and determining whether these predictions meet a predetermined threshold, thereby optimizing model parameters and reducing computational burden.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If traditional resist and etch model calibration processes are used, then model accuracy is improved, but calibration time and computational resources increase significantly
Solution Approach 1:
The patent pre-calculates and stores resist signals for various gauge patterns before calibration begins. These pre-computed signals are saved in a database and reused during iterative calibration, eliminating the need to recalculate them in each iteration and significantly reducing calibration time while maintaining model accuracy
Solution Approach 2:
The patent creates a database of pre-calculated resist signals that serve as reusable templates. Instead of performing heavy computational calculations repeatedly during calibration, the system copies and retrieves pre-computed signal data from the database, reducing computational burden while preserving the accuracy needed for model calibration
2Measurement precision
If traditional resist and etch model calibration processes are used, then model accuracy is improved, but memory requirements increase significantly
Solution Approach 1:
The patent pre-calculates and stores resist signals in a database before calibration begins. By performing this computationally intensive calculation in advance and storing the results, the system avoids needing to maintain large computational workspaces in memory during the actual calibration process, thus reducing peak memory requirements while preserving model accuracy
3Measurement precision
If repeated calculations are performed during calibration iterations, then model accuracy is improved, but computational load increases significantly
Solution Approach 1:
The patent retrieves pre-calculated resist signals from a database during calibration iterations instead of recalculating them. This copying approach allows the system to perform multiple iterations for model accuracy without repeating the heavy computational work of signal calculation, thus maintaining accuracy while significantly reducing computational load
Solution Approach 2:
The patent implements an iterative calibration process that uses feedback from previous calculations. By storing pre-calculated signals and using them to inform subsequent calibration iterations, the system efficiently refines model parameters without repeating unnecessary computations, balancing accuracy improvement with computational efficiency
Data Source
AI summary
A method for accelerating calibration of a fabrication process model, the method including performing one or more iterations of: defining one or more fabrication process model terms; receiving predetermined information related to the one or more fabrication process model terms; generating a fabrication process model based on the predetermined information, the fabrication process model configured to generate one or more predictions related to a metrology gauge; determining whether a prediction related to a dimension of a gauge is within a predetermined threshold of the gauge as measured on a post-fabrication process substrate; and responsive to the prediction not breaching the predetermined threshold, optimizing the one or more fabrication process terms such that the prediction related to the dimension of the gauge is within the predetermined threshold of the gauge as measured on the post-fabrication process substrate.