Resist Filtering System with Segmented Polar and Non-Polar Filters
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Solution Overview
Problem
In the context of semiconductor manufacturing, existing resist filtering systems face challenges in achieving high efficiency in filtering out polar and non-polar foreign materials from resist materials, which can lead to impurities in the photolithography process, affecting the quality of miniaturized patterns.
Innovation Solution
A resist coating apparatus is designed with a resist filtering system that includes a first filter for polar foreign materials, a bubble trap, a pump, and a second filter for non-polar foreign materials, all connected in series, with the first and second filters comprising multiple unit filters connected in parallel to enhance filtering efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a single filter is used to filter both polar and non-polar foreign materials, then the device complexity is reduced, but the manufacturing precision deteriorates due to inability to independently filter different types of impurities
Solution Approach 1:
The filtering system is divided into multiple independent filters: a first filter for polar foreign materials and a second filter for non-polar foreign materials. Each filter is configured to specifically remove one type of impurity, enabling independent optimization of filtering performance for each impurity type without interference from the other.
Solution Approach 2:
Each filter in the system is designed with specific local properties tailored to its function. The first filter has properties optimized for capturing polar foreign materials, while the second filter has properties optimized for non-polar foreign materials. This localized specialization allows each component to perform its specific filtering function at high efficiency.
2Manufacturing precision
If multiple filters are connected in series, then the filtering efficiency is improved, but the pressure loss increases due to multiple filtration stages
Solution Approach 1:
The system uses multiple filtration stages with progressively finer filtering capabilities. The first filter removes polar foreign materials, and the second filter removes non-polar foreign materials. By distributing the filtering action across multiple specialized stages rather than using a single excessive filter, the system achieves high resist purity while managing pressure loss through optimized flow distribution.
3Reliability
If a single filter handles all foreign materials, then the ease of operation is improved, but the reliability deteriorates due to potential contamination from one filter type to another
Solution Approach 1:
The filtering system is segmented into specialized filters for different impurity types. The first filter is dedicated to polar foreign materials and the second filter is dedicated to non-polar foreign materials. This segmentation prevents cross-contamination between filter types and ensures that each filter operates within its optimal performance range, thereby improving reliability.
Solution Approach 2:
Each filter is designed with local quality characteristics specifically suited for its designated impurity type. This specialization ensures that polar and non-polar foreign materials are removed by appropriately designed filters, preventing any potential contamination that might occur in a generic single-filter system and maintaining high resist material purity.
Data Source
AI summary
A resist coating apparatus including a resist supplying system; a resist filtering system having a first filter, a second filter, and a pump between the first filter and the second filter; and a resist dispensing system, wherein the first filter includes a plurality of first unit filters connected in parallel.