Resist Composition with Fluorinated Acid Generator
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Solution Overview
Problem
Current resist compositions face challenges in achieving both excellent solubility in developing solutions and satisfactory lithography properties, particularly due to the deterioration of acid generator solubility in alkali developing solutions, leading to defects and pattern irregularities in resist patterns.
Innovation Solution
A resist composition incorporating a base component with changed solubility in an alkali developing solution and an acid-generator component that includes a compound with a base dissociable group within its cation moiety, allowing for controlled acid generation and solubility changes upon exposure, thereby forming a resist pattern with improved properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional onium salt-based acid generators with long alkyl groups are used to suppress acid diffusion, then lithography resolution is improved, but solubility in alkali developing solutions deteriorates
Solution Approach 1:
The patent changes the chemical parameters of the acid generator by replacing conventional onium salts with sulfonic acid compounds containing specific hydrophobic groups (fluorinated alkyl groups with 3-15 carbon atoms). This parameter change allows the acid generator to maintain low solubility in the resist film (suppressing acid diffusion) while improving solubility in alkali developing solutions, thereby resolving the contradiction between lithography resolution and acid generator solubility
Solution Approach 2:
The patent creates a composite acid generator structure by combining sulfonic acid functional groups with hydrophobic fluorinated alkyl groups (CF3-(CF2)n- where n=1-7). This composite structure enables the molecule to exhibit dual characteristics: hydrophobicity for suppressing acid diffusion in the resist film and sufficient solubility in alkali developing solutions for complete development, thus resolving the solubility contradiction
2Shape
If acid generators with high hydrophobicity are used to reduce acid diffusion, then pattern sharpness is improved, but solubility in developing solutions deteriorates causing defects
Solution Approach 1:
The patent optimizes the hydrophobic group parameters by selecting fluorinated alkyl groups with specific carbon chain lengths (3-15 carbons) and structures (CF3-(CF2)n-). This parameter optimization achieves the right balance: sufficient hydrophobicity to maintain pattern sharpness by suppressing acid diffusion, while maintaining adequate solubility in alkali developing solutions to prevent development defects such as footing and scum formation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the solubility and lithography performance of the resist composition, reducing defects and improving the formation of precise resist patterns by controlling the solubility changes in response to acid generation.
Implementation Method 1
an acid-generator component (B) which generates acid upon exposure
Data Source
AI summary
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.