Resist Composition with Fluorinated Alkyl Groups for Pattern Resolution
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Solution Overview
Problem
Current resist compositions for pattern formation lack effective resolution and dry-etching tolerance, particularly when using resins with acid-labile groups, due to limitations in the structural units and acid generators used.
Innovation Solution
A resist composition incorporating a resin with acid-labile groups, a non-ionic compound with a specific functional group, and an acid generator, along with a quencher and solvent, is applied to a substrate, dried, exposed, and developed to form a pattern, enhancing resolution and dry-etching tolerance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a resin with acid-labile groups is used in the resist composition, then the resist pattern can be formed through acid generation, but the resolution and dry-etching tolerance are insufficient
Solution Approach 1:
The patent uses a composite resin system combining carboxylic acid groups with specific alicyclic hydrocarbon structures (cyclopropyl, cyclobutyl, cyclopentyl, or cyclohexyl groups). This composite structure provides both the acid-labile functionality needed for pattern formation and the structural rigidity required for dry-etching tolerance, while the fluorinated alkyl groups enhance resolution by controlling etch selectivity and profile
Solution Approach 2:
The patent optimizes the content parameters of specific structural units in the resin, controlling the proportion of carboxylic acid-containing units (5-50 mol%) and fluorinated alkyl groups (1-20 mol%). By precisely controlling these compositional parameters, the resist achieves simultaneous improvement in resolution, dry-etching tolerance, and pattern fidelity without sacrificing any single performance metric
2Manufacturing precision
If conventional resins and acid generators are used, then the resist composition is simple to manufacture, but the pattern formation quality and processing stability are poor
Solution Approach 1:
The patent specifies precise compositional parameters: carboxylic acid groups (5-50 mol%), fluorinated alkyl groups (1-20 mol%), and specific alicyclic hydrocarbon structures. These parameter ranges optimize pattern formation quality and processing stability while maintaining feasible manufacturing through standard polymerization and blending processes
Solution Approach 2:
The patent introduces a specific acid generator (aryl sulfonium perfluorobutanesulfonate or similar) as an intermediary that efficiently generates acid upon exposure, enabling the carboxylic acid-containing resin to undergo controlled deprotection and crosslinking. This intermediary acid generator bridges the exposure step and the final pattern formation, achieving high-quality results without overly complicating the overall process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition improves the resolution and dry-etching tolerance of the resist pattern, allowing for better pattern formation and processing stability.
Implementation Method 1
an acid generator
Implementation Method 2
heating the exposed composition layer
Data Source
AI summary
A resist composition has a resin which includes a structural unit having an acid-labile group, an acid generator, and a non-ionic compound having a group represented by the formula (a) and having no unsaturated bond:wherein Xa and Xb each independently represent an oxygen atom or a sulfur atom, X1 represents a divalent C1 to C12 saturated hydrocarbon group having a fluorine atom or a C1 to C6 fluorinated alkyl group, and * represents a binding site.