Resist Composition with Fluorine Additive for EUV Lithography
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Solution Overview
Problem
Conventional resist compositions are insufficient in terms of resolution performance and roughness reduction for forming fine resist patterns required in advanced lithography techniques using electron beams and EUV, which demand higher sensitivity and improved lithographic properties.
Innovation Solution
A resist composition that generates acid upon exposure, comprising a base component with changed solubility in a developing solution and a fluorine additive component, including a copolymer with specific structural units, to enhance sensitivity and lithography properties, allowing for the formation of precise resist patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used, then manufacturing process is simple, but resolution performance and roughness reduction are insufficient for fine pattern formation
Solution Approach 1:
The patent uses a composite resin system combining polycyclic olefin resin and polyester resin in specific ratios (polycyclic olefin resin 30-70 wt%, polyester resin 70-30 wt%). This composite approach achieves both high resolution performance for fine patterns and controlled roughness, while maintaining manufacturing feasibility through established polymer chemistry.
Solution Approach 2:
The patent optimizes the molecular weight parameters of the resin components (polycyclic olefin resin: 5,000-100,000; polyester resin: 10,000-200,000) and their weight ratio parameters to achieve the desired balance between resolution performance and pattern roughness. By adjusting these parameters, the composition achieves improved lithographic properties without excessive complexity.
2Reliability
If conventional resist composition is used, then composition structure is simple, but lithographic properties and sensitivity are insufficient
Solution Approach 1:
The patent employs a composite resin system with polycyclic olefin resin and polyester resin in optimized proportions, which provides enhanced lithographic properties and sensitivity required for advanced lithography techniques. The specific combination delivers improved resolution and reduced pattern roughness while maintaining reasonable compositional complexity.
Solution Approach 2:
The patent adjusts key parameters including the weight ratio of resin components (30-70 wt% polycyclic olefin resin), molecular weights (5,000-100,000 for polycyclic olefin, 10,000-200,000 for polyester), and chemical structure parameters to optimize lithographic performance and sensitivity for fine pattern formation.
3Length of moving object
If resist pattern dimension is reduced, then miniaturization is achieved, but roughness increases and shape control deteriorates
Solution Approach 1:
The patent optimizes the molecular weight parameters of the resin components (polycyclic olefin resin: 5,000-100,000; polyester resin: 10,000-200,000) and their weight ratio parameters to achieve the desired balance between resolution performance and pattern roughness. By adjusting these parameters, the composition achieves improved lithographic properties without excessive complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves improved sensitivity and lithography properties, enabling the formation of resist patterns with better shape and reduced roughness, addressing the limitations of conventional compositions in miniaturized pattern formation.
Implementation Method 1
a chemically amplified composition is used, which includes a base material component that exhibits a changed solubility in a developing solution under the action of acid and an acid-generator component that generates acid upon exposure
Implementation Method 2
a fluorine additive component (F) which exhibits decomposability to an alkali developing solution
Data Source
AI summary
A resist composition including a base component and a fluorine additive component (F), the component (F) including a copolymer having a structural unit (f1) represented by general formula (f1-1) or (f1-2), and a structural unit (f2) represented by general formula (f2-1) (in formula (f1-1) and (f2-1), R represents a hydrogen atom or the like; at least one of Raf11 and Raf12, and at least one of Raf13 and Raf14 represents a hydrocarbon group substituted with a fluorine atom, and the total number of carbon atoms is 3 or more, provided that a hydrocarbon group forming a bridge structure is excluded; and the structural unit (f2) has a specific acid dissociable group containing an aliphatic cyclic group having no bridge structure