Resist Composition for Enhanced Focus Margin and Resolution
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Solution Overview
Problem
Conventional resist compositions fail to consistently meet the focus margin requirements for producing resist patterns, leading to suboptimal results.
Innovation Solution
A resist composition comprising a resin with specific structural units and an acid generator, applied in a method involving application, drying, exposure, and development, to achieve improved solubility and pattern resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used, then manufacturing process is simple, but focus margin is insufficient
Solution Approach 1:
The patent uses a composite resin system comprising a first resin (polymer containing carboxyl groups) and a second resin (polymer containing hydroxyl groups), creating a multi-component resist composition that achieves improved focus margin and pattern resolution while maintaining processability
Solution Approach 2:
The patent optimizes specific parameters including the molecular weight of resins (first resin: 5,000-50,000, second resin: 10,000-100,000), the ratio of resins (1:9 to 9:1 by weight), and the content of structural units to achieve the desired balance between focus margin and composition complexity
2Manufacturing precision
If resin solubility in alkali is increased, then pattern resolution improves, but dry etching resistance decreases
Solution Approach 1:
The patent introduces different resin components with specific functional groups (carboxyl groups in first resin, hydroxyl groups in second resin) that provide localized chemical properties, enabling the resist to exhibit both high alkali solubility for pattern formation and sufficient dry etching resistance through the synergistic effect of these functional groups
Solution Approach 2:
The combination of first resin containing carboxyl groups and second resin containing hydroxyl groups creates a composite material system where each component contributes different properties: the carboxyl-containing resin provides alkali solubility for good pattern resolution, while the hydroxyl-containing resin enhances dry etching resistance
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enhances the focus margin and pattern resolution, addressing the limitations of conventional resist compositions by ensuring better alkali solubility and dry etching resistance.
Implementation Method 1
a resin having a structural unit represented by the formula (I)... becoming soluble in an alkali aqueous solution by the action of an acid
Implementation Method 2
becoming soluble in an alkali aqueous solution by the action of an acid
Data Source
AI summary
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II),wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.