Resist Composition with Halogenated Acid Generator for EUV Lithography
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Solution Overview
Problem
Current resist compositions used in semiconductor and liquid crystal display manufacturing, particularly with onium salt-based acid generators, face challenges in achieving high sensitivity and uniformity for pattern miniaturization with extreme ultraviolet rays (EUV) or electron beams (EB), as they have limited sensitivity due to the polycyclic structure of their anion moiety.
Innovation Solution
A resist composition is developed that includes a base material component and an acid generator component, where the acid generator contains a compound with a fused cyclic group having aromatic and alicyclic rings, with substituents containing bromine or iodine atoms, enhancing sensitivity and uniformity by altering solubility in developing solutions upon light exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If an onium salt-based acid generator with a polycyclic anion structure is used, then uniformity of the acid generator in the resist film is improved, but sensitivity is insufficient
Solution Approach 1:
The patent changes the chemical parameters of the anion by introducing specific substituents (hydrocarbon groups with bromine or iodine atoms) at defined positions (5 and 6 positions of the bicyclooctane skeleton) to optimize both uniformity and sensitivity simultaneously
Solution Approach 2:
The patent creates a composite acid generator structure combining the onium cation with a specifically designed anion containing fused aromatic and alicyclic rings with halogen substituents, achieving synergistic effects for improved lithography performance
2Measurement precision
If the wavelength of exposure light source is shortened to achieve pattern miniaturization, then resolution is improved, but sensitivity is reduced due to fewer photons
Solution Approach 1:
The patent modifies the molecular structure parameters of the acid generator by incorporating heavy atoms (bromine or iodine) in specific positions to enhance the photochemical efficiency and sensitivity for short-wavelength exposure
Solution Approach 2:
The patent uses the bicyclooctane skeleton as a stable core structure that has been proven effective, and copies this successful structural motif while adding functional substituents to achieve improved performance
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves high sensitivity and satisfactory critical dimension uniformity, improving lithography characteristics for EUV and EB exposure, enabling the formation of precise resist patterns with enhanced sensitivity and uniformity.
Implementation Method 1
an acid generator component (B) which generates an acid upon light exposure
Data Source
AI summary
A resist composition including a base material component and a compound represented by General Formula (b0), in which Rb0 represents a fused cyclic group in which an aromatic ring and an alicyclic ring are fused, the alicyclic ring in the fused cyclic group has substituents, at least one of the substituents contains a hydrocarbon group having a bromine atom or an iodine atom, Yb0 represents a divalent linking group or a single bond, Yb0 is bonded to the alicyclic ring in the fused cyclic group, Vb0 represents a single bond, an alkylene group, or a fluorinated alkylene group, R0 represents a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom, Mm+ represents an m-valent organic cation, and m represents an integer of 1 or greater