Resist Ink Silane Crosslinking for Pinhole Prevention
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Solution Overview
Problem
In the fabrication of active matrix display devices like LCDs, the existing resist ink printing methods face challenges such as pinhole formation and defects due to liquation of non-crosslinked components during the baking process, leading to issues like narrower pattern widths and short-circuits during etching.
Innovation Solution
A resist ink composition with a silane coupling agent is introduced, which enhances acid-resistance and improves coupling forces between the resist ink and the etching target layer, preventing pinhole formation and defects by crosslinking the ink, thereby ensuring accurate pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional resist ink is used without crosslinking agents, then the resist ink is simple and easy to apply, but non-crosslinked components liquate during baking causing pinhole formation and defects
Solution Approach 1:
The patent applies composite materials by combining resist ink with crosslinking agents (silane coupling agents, metal coupling agents, or phosphate coupling agents) to create a composite resist ink system. This composite formulation enables the resist ink to maintain its simplicity for application while gaining the reliability to prevent liquation and pinhole formation during the baking process through crosslinking of non-crosslinked components.
2Manufacturing precision
If photolithography is used for pattern formation, then accurate patterns can be formed, but the process requires splitting the screen and repeating the process multiple times, lowering productivity
Solution Approach 1:
The patent replaces the mechanical photolithography system with a direct printing method using resist ink. Instead of using light exposure and film splitting, the resist ink is directly printed or coated onto the substrate in the desired pattern, eliminating the need for screen splitting and multiple repeated processes while maintaining pattern accuracy.
Solution Approach 2:
The patent changes the fundamental parameter of pattern formation from optical exposure (photolithography) to direct material deposition (printing/coating). This parameter change enables single-pass pattern formation without screen splitting, significantly improving productivity while maintaining manufacturing precision through controlled resist ink application.
3Ease of manufacture
If resist ink is applied without crosslinking enhancement, then the application process is simple, but the resist ink peels away during wet etching exposing metal layers and causing short-circuits
Solution Approach 1:
The patent applies preliminary action by incorporating crosslinking agents into the resist ink formulation before application. This preliminary chemical preparation ensures that the resist ink is pre-equipped to resist peeling during subsequent wet etching processes, eliminating the need for post-application treatment while maintaining application simplicity and enhancing reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The use of silane coupling agents in the resist ink prevents defects and enhances acid-resistance, resulting in more precise and reliable pattern formation without pinholes or peeling issues during wet etching.
Implementation Method 1
an addition of a silane coupling agent to the resist ink leads to a formation of a crosslink and an improved coupling force between the resist ink and an etching target layer
Implementation Method 2
The coupling agent may be one of methacryloxy propyltrimethoxy silane, N-(2-aminoethyl)-3-aminopropyltrimethoxy silane, γ-mercapto-propyltriethoxy silane
Implementation Method 3
an addition of a silane coupling agent to the resist ink leads to a formation of a crosslink and an improved coupling force between the resist ink and an etching target layer
Data Source
AI summary
Disclosed is a resist ink having superior acid-resistance and coupling property, the resist ink composed of 70% or less by weight of solvent, 10-15% by weight of base polymer, 10-15% by weight of tacktifier, 3% or less by weight of additive, and 1-10% by weight of coupling agent.