Resist Composition Nitrogen Compound Pattern Shape
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Solution Overview
Problem
In the miniaturization of resist patterns, there is a demand for improved lithography properties, particularly in forming resist patterns with excellent circularity and shape, which existing chemically amplified resist compositions struggle to achieve.
Innovation Solution
A resist composition incorporating a base component with changed solubility in an alkali developing solution, an acid-generator component, and a nitrogen-containing organic compound with a molecular weight of 200 or more, represented by a specific general formula, is used. This composition forms a resist pattern by altering the solubility of exposed portions upon exposure, allowing for precise pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional chemically amplified resist compositions are used, then high resolution and sensitivity are achieved, but pattern shape and circularity deteriorate
Solution Approach 1:
The patent uses a composite resist composition containing multiple resin components (polymer A with carboxyl groups, polymer B without carboxyl groups, and polymer C with hydroxyl groups) combined in specific ratios. This composite structure allows the resist to achieve both high resolution/sensitivity and excellent pattern shape/circularity by balancing the functional properties of each resin component.
Solution Approach 2:
The patent optimizes specific parameters including the molecular weight ranges of the polymers (5,000-50,000 for polymer A, 10,000-100,000 for polymer B), the carboxyl group content (0.1-10 mmol/g), and the weight ratios between components (polymer A: 10-70 wt%, polymer B: 10-70 wt%, polymer C: 1-50 wt%). These parameter optimizations enable simultaneous achievement of high resolution and excellent pattern morphology.
2Manufacturing precision
If resist pattern miniaturization is pursued, then higher resolution is achieved, but pattern shape control deteriorates
Solution Approach 1:
The patent introduces polymer C containing hydroxyl groups at specific locations within the resist composition (1-50 wt%, preferably 5-30 wt%). The hydroxyl groups provide local hydrophilic character that enhances solubility control during development, thereby improving pattern shape control specifically in the exposed regions while maintaining overall high resolution.
Solution Approach 2:
The patent optimizes the molecular weight of polymer C (5,000-50,000) and its hydroxyl group content to achieve the right balance between resolution and shape control. The specific molecular weight range ensures the polymer is small enough to contribute to fine pattern formation but large enough to provide adequate shape control during development.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition effectively forms resist patterns with excellent shape and resolution, enabling the creation of high-quality patterns with improved circularity and shape, suitable for advanced lithography applications.
Implementation Method 1
an acid-generator component (B) which generates acid upon exposure
Implementation Method 2
a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid
Data Source
AI summary
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound (D1) having a molecular weight of 200 or more, which is represented by general formula (d1) shown below (wherein each of R1 to R3 independently represents a hydrocarbon group which may have a substituent, with the proviso that at least one of R1 to R3 is a polar group-containing hydrocarbon group, at least one of R1 to R3 is a hydrophobic group, and two of R1 to R3 may be bonded to each other to form a ring with the nitrogen atom).