Resist Composition Particle Reduction via Pre-dissolved Photoacid Generator
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Solution Overview
Problem
Existing methods for producing actinic ray-sensitive or radiation-sensitive resin compositions for semiconductor manufacturing result in high particle content due to undissolved photoacid generators and low stirring efficiency, leading to suboptimal film thickness and quality.
Innovation Solution
A method involving the preparation of an intermediate solution with a photoacid generator and solvent, followed by mixing with a resin to achieve a high-viscosity resist composition with reduced particle content, using solvents like propylene glycol monomethyl ether acetate and ethyl lactate, and incorporating a compound represented by General Formula (ZI-5) to enhance solubility and reduce particle generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional mixing methods are used to prepare resist composition, then production process is simple, but particle content increases due to undissolved photoacid generators
Solution Approach 1:
The photoacid generator is pre-dissolved in the solvent to prepare an intermediate solution before mixing with the resin. This preliminary dissolution action ensures complete solubility and prevents particle formation during subsequent mixing operations, directly addressing the particle content issue while maintaining process feasibility
Solution Approach 2:
An intermediate solution is introduced as a mediator between the photoacid generator and the resin. This intermediate solution, containing the pre-dissolved photoacid generator in solvent, facilitates uniform distribution and complete dissolution without requiring complex mixing equipment or procedures, thus reducing particle content without significantly increasing process complexity
2Reliability
If high concentration of photoacid generator is used, then resist performance improves, but solubility decreases leading to undissolved particles
Solution Approach 1:
The patent optimizes the concentration parameters of the photoacid generator in the intermediate solution to achieve a balance between resist performance and solubility. By carefully controlling the amount of photoacid generator and the type of solvent used, the method enables high concentrations that improve resist performance while maintaining complete solubility and preventing particle formation
3Manufacturing precision
If conventional stirring is used, then mixing time is short, but stirring efficiency is low resulting in poor film thickness uniformity
Solution Approach 1:
The photoacid generator is pre-dissolved in the solvent before mixing with the resin, creating a homogeneous intermediate solution. This preliminary action eliminates the need for prolonged stirring to achieve uniform distribution, thereby improving film thickness uniformity without significantly increasing the overall mixing time
Solution Approach 2:
The intermediate solution is prepared to be homogeneous through pre-dissolution of the photoacid generator in the solvent. This homogeneity is maintained during subsequent mixing with the resin, ensuring uniform distribution throughout the resist composition and resulting in consistent film thickness without requiring extended mixing periods
Data Source
AI summary
A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, comprising: preparing an intermediate solution which includes a photoacid generator and a solvent; and mixing the intermediate solution with at least a resin to prepare an actinic ray-sensitive or radiation-sensitive resin composition having a viscosity of 10 mPa·s or more.