Chemical Amplification Resist Production Process
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Solution Overview
Problem
Current methods for producing chemical amplification-type resist compositions fail to adequately suppress defects such as fine scum and microbridges in resist patterns after development, and do not sufficiently improve storage stability, especially for high-resolution patterns below 0.11 µm, despite efforts to filter out fine particles and improve the resist composition.
Innovation Solution
A production process where raw materials are dissolved in solvents before mixing, using specific solvents and filters with controlled pore sizes to minimize particle aggregation and enhance storage stability, involving the use of polyethylene, polypropylene, or polysulfone filters, and optimizing the concentration and composition of acid generators and resins to improve pattern resolution and defect reduction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional filtering methods are used to remove fine particles from resist composition, then particle reduction is achieved, but defect suppression (fine scum and microbridges) remains insufficient
Solution Approach 1:
The patent applies preliminary action by dissolving raw materials in solvents before mixing to prevent particle aggregation from occurring in the first place. This proactive approach addresses the root cause of particle formation rather than merely filtering particles after they form, thereby simultaneously improving defect suppression and maintaining storage stability.
Solution Approach 2:
The patent changes the physical state parameter of raw materials from solid to dissolved state by using solvents. This parameter change prevents particle aggregation and fine particle formation, effectively suppressing defects while maintaining composition stability during storage.
2Reliability
If resist composition is filtered to reduce fine particles, then particle count decreases, but storage stability is not sufficiently improved
Solution Approach 1:
The patent performs preliminary dissolution of raw materials in solvents before mixing, which prevents particle aggregation during storage. This preliminary action eliminates the need for complex filtration processes while achieving superior storage stability.
Solution Approach 2:
The patent extracts the problematic solid raw materials and replaces them with dissolved forms in solvents. This extraction of solids eliminates the source of particle aggregation, improving storage stability without requiring additional filtration equipment or processes.
3Manufacturing precision
If conventional resist composition methods are used, then production is simpler, but high-resolution patterns below 0.11 µm exhibit insufficient defect suppression
Solution Approach 1:
The patent applies preliminary dissolution of raw materials in solvents before mixing, which prevents particle aggregation that would otherwise degrade high-resolution patterns. This simple preliminary step enables achievement of patterns below 0.11 µm without complex production processes.
Solution Approach 2:
The patent changes the physical state of raw materials from solid to dissolved, which prevents particle formation and enables high-resolution patterning. This parameter change achieves superior pattern resolution while maintaining production simplicity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The process effectively reduces defects and improves storage stability by minimizing particle formation and optimizing the resist composition, leading to enhanced resolution and reliability in producing high-quality resist patterns.
Implementation Method 1
passing the resist composition through a filter
Implementation Method 2
produces an acid in the exposed area upon irradiation with radiation such as far ultraviolet ray
Data Source
AI summary
A production process of a chemical amplification-type resist composition, which is a process for producing a chemical amplification-type composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer is changed under an action of an acid; (C) a basic compound; (D) a surfactant; and (E) a solvent, the production process comprising: preparing a solution containing the component (A); and mixing the solution containing the component (A) with the components (B) to (E), and a chemical amplification-type resist composition produced by the production process. The production process ensures that the generation of a defect, particularly fine scum or microbridge, in the resist pattern after development can be suppressed. Another advantage is that the resist composition shows an excellent storage stability.