Resist Composition Quencher for Acid Diffusion Control
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Solution Overview
Problem
Current resist compositions face challenges in achieving high sensitivity and reducing Line Width Roughness (LWR) and Critical Dimension Uniformity (CDU) due to limitations in acid diffusion control and light contrast, especially as feature sizes approach the diffraction limit of light in microelectronic device manufacturing.
Innovation Solution
A resist composition incorporating a salt compound with a nitrogen-containing iodine-substituted aromatic ring and a 1,1,1,3,3,3-hexafluoro-2-propanol group as a quencher, which effectively suppresses acid diffusion and enhances sensitivity, contrast, and resolution by uniformly distributing the quencher in the resist film.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional quenchers (amine compounds or sulfonium/iodonium salts) are used to control acid diffusion, then acid diffusion control is achieved, but sensitivity and contrast are insufficient
Solution Approach 1:
The patent changes the chemical parameters of the quencher by introducing a specific compound structure (formula 1) with unique functional groups that simultaneously achieve acid diffusion control and high sensitivity/contrast. The quencher contains a specific molecular structure with electron-withdrawing groups that optimize both acid capture capability and photo sensitivity.
Solution Approach 2:
The patent creates a composite quencher molecule that combines multiple functional groups (formula 1) to achieve multiple functions simultaneously: acid diffusion control, high sensitivity, and high contrast. This composite molecular structure integrates the capabilities of different functional groups into a single quencher compound.
2Productivity
If feature size is reduced to increase integration density, then manufacturing capability is improved, but light contrast lowers and resolution margin decreases
Solution Approach 1:
The patent changes the chemical parameters of the resist system by introducing a novel quencher compound that enhances light contrast through improved acid diffusion control. This allows smaller feature sizes to be resolved with adequate contrast and focus margin.
Solution Approach 2:
The patent replaces reliance on optical parameters alone with a chemically enhanced system where the quencher compound provides additional control over pattern formation through acid diffusion management, enabling resolution beyond what optical parameters alone could achieve.
3Manufacturing precision
If quencher amount is increased to improve acid diffusion control, then acid diffusion control is enhanced, but sensitivity decreases due to photo-decomposition
Solution Approach 1:
The patent changes the chemical stability parameters of the quencher by designing a compound with enhanced photo-stability (formula 1). This structure resists photo-decomposition, allowing the quencher to maintain its acid diffusion control function even at lower concentrations that preserve sensitivity.
Solution Approach 2:
The patent moves away from using large amounts of photo-labile quenchers (which decompose and require higher loading) to a more stable quencher structure that maintains functionality at lower concentrations, effectively replacing a short-lived component with a more durable one.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves high sensitivity, reduced LWR, improved CDU, and wide process margins, effectively addressing the limitations of existing technologies in microelectronic device patterning.
Implementation Method 1
Quenchers are often added to these resist compositions for the purpose of controlling the diffusion of the acid to unexposed region to improve the contrast
Implementation Method 2
a salt compound having a nitrogen-containing iodine-substituted aromatic ring and a 1,1,1,3,3,3-hexafluoro-2-propanol group as a quencher, which effectively suppresses acid diffusion
Implementation Method 3
a salt compound having a nitrogen-containing iodine-substituted aromatic ring... as a quencher
Implementation Method 4
Chemically amplified resist compositions comprising an acid generator capable of generating an acid upon exposure to light or EB
Data Source
AI summary
A resist composition is provided comprising a base polymer and a quencher comprising a salt compound obtained from a nitrogen-containing compound having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbon group and a compound having a 1,1,1,3,3,3-hexafluoro-2-propanol group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.