Resist Composition Quencher for Lithography Stability
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Solution Overview
Problem
Conventional tertiary amines used as quenchers in resist compositions for lithography suffer from high nucleophilicity and basicity, leading to degradation of ester bonds and impaired storage stability and lithography properties, while existing nitrogen-containing organic compounds do not adequately address line width roughness and critical dimension uniformity.
Innovation Solution
A resist composition incorporating a nitrogen-containing organic compound with a specific formula, including a methylene, ethylene, or oxygen group, which acts as a quencher to control acid diffusion and improve lithography properties, comprising a base material component that changes solubility in an alkali developing solution and an acid generator component that generates acid upon exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional tertiary amines are used as quenchers in resist compositions, then acid diffusion can be controlled and lithography properties improved, but high nucleophilicity and basicity cause degradation of ester bonds leading to impaired storage stability
Solution Approach 1:
The patent modifies the chemical parameters of the quencher by introducing specific structural features (fluorinated alkyl groups with 3-15 carbon atoms) to the nitrogen-containing organic compound. This parameter change reduces the nucleophilicity and basicity of the quencher, preventing ester bond degradation while maintaining acid diffusion control capability, thus resolving the contradiction between lithography performance and storage stability.
Solution Approach 2:
The patent creates a composite quencher structure by combining nitrogen-containing organic compounds with fluorinated alkyl groups. This composite material approach integrates the acid-trapping capability of nitrogen-containing compounds with the steric and electronic effects of fluorinated groups, achieving both good lithography properties and improved storage stability.
2Reliability
If conventional quenchers are used to control acid diffusion, then lithography properties improve, but line width roughness and critical dimension uniformity are not adequately addressed
Solution Approach 1:
The patent optimizes the carbon atom count parameter of the fluorinated alkyl group (3-15 atoms) to precisely control the quencher's molecular size and steric hindrance. This parameter optimization enables better control over acid diffusion length and distribution, directly improving line width roughness and critical dimension uniformity while maintaining good lithography properties.
3Reliability
If nitrogen-containing organic compounds are added to resist composition, then acid diffusion control improves, but pattern shape and resolution are not optimized
Solution Approach 1:
The patent combines nitrogen-containing organic compounds with fluorinated alkyl groups to create a composite quencher that simultaneously provides excellent acid diffusion control through the nitrogen atom and improved pattern shape and resolution through the fluorinated group's electronic and steric effects. The synergistic interaction between these components optimizes both acid diffusion control and patterning quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves superior lithography properties and favorable pattern shapes with improved storage stability and resolution, addressing the limitations of conventional quenchers and existing nitrogen-containing organic compounds.
Implementation Method 1
an acid generator component (B) that generates acid upon exposure
Implementation Method 2
a nitrogen-containing organic compound (D)... which acts as a quencher to control acid diffusion
Data Source
AI summary
A resist composition including a base material component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid generator component (B) that generates acid upon exposure, and an nitrogen-containing organic compound (D), wherein the nitrogen-containing organic compound (D) includes a compound represented by general formula (d1) shown below:wherein R20 represents a methylene group, an ethylene group, an oxygen atom or —C(CH3)2—; R21 represents a hydrogen atom or an organic group; and R22 represents an alkoxy group, an alkoxycarbonyloxy group, a hydroxyl group, a halogen atom, —C(═O)—O—R23, —C(═O)—NH—R23 or a carboxyl group, wherein R23 represents a linear or branched alkyl group of 1 to 15 carbon atoms, an unsaturated hydrocarbon group, an aliphatic cyclic group, or an aromatic hydrocarbon group, and a represents an integer of 0 to 2.