Resist Composition Salt for CD Uniformity
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Solution Overview
Problem
Existing resist compositions for semiconductor fine processing struggle with achieving uniform critical dimension (CD) uniformity in resist patterns.
Innovation Solution
A salt represented by formula (I) is used to generate an acid, which is incorporated into a resist composition, along with a resin containing an acid-labile group, to improve CD uniformity during the production of resist patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional acid generators are used in resist composition, then the resist pattern can be formed, but the critical dimension (CD) uniformity is insufficient
Solution Approach 1:
The patent modifies the molecular structure of the acid generator by introducing specific structural units (formula 1) with adjustable parameters including aromatic hydrocarbon groups (Ar), linking groups (L1, L2), and ester bond configurations (X1). These parameter changes in the molecular structure enable optimization of acid generation characteristics, resulting in improved CD uniformity while maintaining reliable pattern formation in the resist composition
Solution Approach 2:
The patent creates a composite acid generator molecule combining multiple functional components: a base structure with ester bonds (X1), aromatic hydrocarbon groups (Ar) containing iodine atoms, and hydrocarbon linking groups (L1, L2). This composite molecular structure integrates different functional elements that work synergistically to generate acid with controlled characteristics, achieving both high CD uniformity and reliable pattern formation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition using the salt of formula (I) effectively enhances CD uniformity in resist patterns, improving the precision and quality of semiconductor processing.
Implementation Method 1
a salt represented by formula (I) is used to generate an acid
Data Source
AI summary
Disclosed are a salt represented by formula (I), an acid generator, a resin and a resist composition:wherein Q1, Q2, R1 and R2 each independently represent a H atom, a F atom, a perfluoroalkyl group or an alkyl group; z represents an integer of 0 to 6; X1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O—; L1 represents a single bond or a substituted/unsubstituted hydrocarbon group, —CH2— included in the group may be replaced by —O—, —S—, etc., but —CH2— bonded with Ar1 is not replaced by —O—, —S—, etc.; Ar represents an aromatic hydrocarbon group having an I atom, and the group may have a substituent other than the I atom; R5 represents a H atom, a halogen atom, or an alkyl group which may have a halogen atom; and ZI+ represents an organic cation.