Resist Composition Salt for CD Uniformity
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing resist compositions struggle to achieve satisfactory CD uniformity in resist patterns, which is crucial for precise manufacturing processes.
Innovation Solution
A salt represented by a specific formula is used in a resist composition, incorporating an acid-labile group and various hydrocarbon and halogen atoms, which forms a structural unit within a resin, enhancing the resist pattern's CD uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used, then the manufacturing process is simple, but the CD uniformity of the resist pattern is insufficient
Solution Approach 1:
The patent modifies the chemical structure of the resin by introducing specific structural units with acid-labile groups and controlled substitution patterns. This changes the chemical parameters of the resist composition to achieve better CD uniformity while maintaining processability
Solution Approach 2:
The patent creates a composite resin structure by combining multiple structural units within the same polymer chain, including units with acid-labile groups, halogen atoms, and hydrocarbon groups. This composite approach enables simultaneous optimization of CD uniformity and resist performance
2Manufacturing precision
If the resist composition is optimized for CD uniformity, then the pattern precision improves, but the composition complexity increases
Solution Approach 1:
The patent introduces specific local structural units within the resin polymer chain that have acid-labile groups and controlled substitution patterns. These localized functional regions provide the necessary precision control without requiring complete redesign of the entire composition system
Solution Approach 2:
The resin is designed with segmented structural units where each unit serves a specific function (acid-labile groups for deprotection, halogen atoms for etch resistance, hydrocarbon groups for solubility). This segmentation allows independent optimization of each function while maintaining overall composition manageability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The use of this salt in the resist composition significantly improves CD uniformity, enabling the production of resist patterns with enhanced precision and consistency.
Implementation Method 1
an acid generator, which is a salt represented by formula (I)... an acid-labile group... Exposing the composition layer... Heating the exposed composition layer
Data Source
AI summary
A salt represented by formula (I), an acid generator, a resin, and a resist composition including the same.wherein R1 to R3 each represent a hydroxy group, etc.; R4 to R9 each represent a halogen atom, etc.; R10 represents an acid-labile group; A1 to A3 each represent a hydrocarbon group; m1 and m7 represent an integer of 0 to 5, m2 to m6, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4; Qb1 and Qb2 each represent a hydrogen atom, etc.; Lb1 represents a saturated hydrocarbon group; Yb1 represents a single bond or an alicyclic hydrocarbon group; Rbb1 represents a hydrogen atom, etc.; X10 represents a single bond, etc.; and L10 represents a single bond or a hydrocarbon group.


