Resist Composition Salt for Critical Dimension Uniformity
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Solution Overview
Problem
Existing resist compositions struggle to achieve uniformity in resist patterns, particularly in terms of critical dimension uniformity (CDU), which is crucial for semiconductor processing.
Innovation Solution
A salt represented by formula (I) is used in conjunction with an acid generator and a resin containing an acid-labile group, applied in a resist composition, which undergoes specific processing steps to form a resist pattern with improved CDU.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used, then the basic resist pattern formation is achieved, but the critical dimension uniformity (CDU) is insufficient
Solution Approach 1:
The patent applies parameter changes by modifying the chemical composition parameters of the resist system. Specifically, it introduces a salt containing a carboxylic acid group and an aromatic hydrocarbon group with 6-36 carbon atoms, along with an acid generator. The salt is used at 0.1-10 wt% and the acid generator at 1-50 wt% relative to the resin, optimizing these parameters to achieve improved CDU while maintaining pattern formation reliability
Solution Approach 2:
The patent employs composite materials by creating a multi-component resist composition system. The composition includes: (1) a resin as the base material, (2) a specifically designed salt with carboxylic acid and aromatic hydrocarbon groups, (3) an acid generator, and optionally (4) a base. This composite approach combines materials with complementary functions to simultaneously achieve good CDU and pattern uniformity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition using the salt and acid generator achieves satisfactory CDU in resist patterns, enhancing the precision and quality of semiconductor processing.
Implementation Method 1
an acid generator including the salt... a resist composition comprising the acid generator... a step of exposing the composition layer, and a step of heating the exposed composition layer
Data Source
AI summary
Disclosed are a salt represented by formula (I), an acid generator, a resin, and a resist composition:wherein Q1, Q2, R1 and R2 each represent a hydrogen atom, a fluorine atom, etc., z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO—, *—O—CO—O—, etc., L1 represents a single bond, or a hydrocarbon group which may have a substituent, Ar represents aromatic hydrocarbon group having an iodine atom, R3 and R4 each represent a hydrogen atom, a halogen atom or a hydrocarbon group, R5 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom, and ZI+ represents an organic cation.