Resist Composition Salt for Line Edge Roughness Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing resist compositions struggle to produce resist patterns with improved line edge roughness (LER).
Innovation Solution
A salt represented by formula (I) is used in a resist composition, which includes a specific acid generator and a resin with acid-labile groups, applied in a process involving exposure and development steps to form a resist pattern with enhanced line edge roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional acid generators are used in resist composition, then the basic resist pattern formation function is maintained, but the line edge roughness (LER) cannot be sufficiently improved
Solution Approach 1:
The patent changes the chemical parameters of the acid generator by introducing a specific salt structure with formula (I), where R1-R6 represent various hydrocarbon groups and A- represents a counter anion. This parameter change in the acid generator's molecular structure enables improved line edge roughness while maintaining reliable resist pattern formation, directly resolving the technical contradiction between manufacturing precision and reliability
Solution Approach 2:
The patent creates a composite acid generator system by combining a salt with formula (I) and a specific counter anion (A-). This composite material approach allows the resist composition to achieve both low line edge roughness and stable pattern formation, as the combined structure provides both the reactivity needed for precision and the stability needed for reliability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The salt and resist composition effectively produce resist patterns with improved line edge roughness, addressing the limitations of existing technologies.
Implementation Method 1
a step of exposing the composition layer, a step of heating the exposed composition layer
Data Source
AI summary
The present invention can provide a salt and a resist composition including the salt, capable of producing a resist pattern with satisfactory line edge roughness (LER).A salt represented by formula (I):wherein R1 and R2 each represent a chain hydrocarbon group which may have a substituent, an alicyclic hydrocarbon group which may have a substituent or an aromatic hydrocarbon group which may have a substituent, or R1 and R2 are bonded each other to form a ring together with sulfur atoms to which they are bonded, R3, R4 and R5 each independently represent a hydrogen atom, a fluorine atom or a hydrocarbon group having 1 to 12 carbon atoms, —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—, and A− represents a counter anion.