Resist Composition Salt Structure for Line Edge Roughness Reduction
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Solution Overview
Problem
Existing resist compositions fail to produce resist patterns with satisfactory line edge roughness (LER), a critical parameter in microfabrication processes.
Innovation Solution
A salt represented by formula (I) is used in a resist composition, which includes a structural unit derived from the salt, an acid generator, and a resin with an acid-labile group, to improve line edge roughness through specific chemical structures and bonding configurations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used, then the resist pattern can be formed, but the line edge roughness (LER) is not satisfactory
Solution Approach 1:
The patent changes the chemical parameters of the acid generator by introducing a specific salt structure with formula (I) containing hydroxy groups, alkoxy groups, or carbonyloxy groups at the ortho position of the phenolic hydroxyl group. This structural modification alters the acid generation characteristics and reduces line edge roughness while maintaining pattern formation capability
Solution Approach 2:
The patent creates a composite resist composition by combining the novel salt (I) with specific resins and other additives. The composite structure integrates the acid generator (salt I) with polymer matrices and functional additives to achieve both satisfactory pattern formation and reduced line edge roughness
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition using the salt (I) effectively reduces line edge roughness, enhancing the quality of resist patterns in microfabrication processes.
Implementation Method 1
A1, A2 and A3 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, the hydrocarbon group may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—, in formula (I), R1, R2 and R3 each independently represent a hydroxy group, —O—R10, or —O-L1-CO—O—R10, R10 represents an acid-labile group
Data Source
AI summary
A salt represented by formula (1), an acid generator, a resin, and a resist composition including the same.wherein R1 to R3 each represent a hydroxy group, etc.; R4 to R9 each represent a halogen atom, etc.; R10 represents an acid-labile group; A1 to A3 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5; Qb1 and Qb2 each represent a hydrogen atom, etc.; Lb1 represents a saturated hydrocarbon group; Yb1 represents a single bond or an alicyclic hydrocarbon group; Rbb1 represents a hydrogen atom, etc.; X10 represents a single bond, etc.; and L10 represents a single bond or a hydrocarbon group.