Solution, method of forming resist pattern, and semiconductor device manufacturing method
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Solution Overview
Problem
Semiconductor device manufacturing methods using antioxidants in cleaning compositions can generate defects due to oxidative deterioration, requiring solutions with high stability and defect suppression.
Innovation Solution
A solution comprising an organic solvent and a tocopherol-based antioxidant, which is oil-soluble and environmentally friendly, is used as a pre-wetting, developer, or resist composition solvent to prevent oxidative deterioration and enhance stability, including a combination of ester-based and ether-based solvents for improved compatibility and defect reduction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If antioxidants (such as BHT) are added to organic solvents to prevent oxidative deterioration, then stability is improved, but defects are generated in semiconductor devices
Solution Approach 1:
The patent changes the chemical parameter of the antioxidant from conventional types (BHT) to tocopherol-based compounds. This parameter change maintains the antioxidant function for preventing oxidative deterioration while eliminating the defect generation problem, thus resolving the contradiction between stability improvement and defect prevention.
2Duration of action of stationary object
If conventional antioxidants are used to maintain solution stability over time, then deterioration is suppressed, but defects are generated during semiconductor manufacturing
Solution Approach 1:
The patent applies parameter change by substituting the antioxidant type from conventional chemicals to tocopherol-based compounds. This maintains long-term deterioration suppression capability while eliminating harmful defect generation, thereby resolving the contradiction between duration of action and harmful factor generation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses defect generation and maintains high stability, ensuring the quality of resist patterns and semiconductor device manufacturing processes while being safe and environmentally friendly.
Implementation Method 1
dibutyl hydroxy toluene (also referred to below as BHT), which is a radical chain inhibitor used for plastic antioxidants, may also be added to the organic solvents
Data Source
AI summary
A solution including an organic solvent (S), and an antioxidant (A), in which an antioxidant (A) includes a tocopherol compound (A1).