Resist Solvent Stabilizer Control to Prevent Semiconductor Defects
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Solution Overview
Problem
In semiconductor device manufacturing, the use of organic solvents with stabilizers can lead to defect failures due to the stabilizer remaining on the substrate surface or in the resist film, despite post-exposure baking treatments.
Innovation Solution
A solution comprising an organic solvent and a stabilizer, where the content of the stabilizer is within a predetermined range of 0.1 to 50 mass ppm, is used in the semiconductor device manufacturing process. This solution is specifically formulated to balance the temporal stability of the organic solvent and the defect inhibition properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If an antioxidant stabilizer is added to an organic solvent to prevent temporal decomposition, then the temporal stability of the solvent is improved, but the stabilizer remains on the substrate surface after post-exposure baking and causes defect failures
Solution Approach 1:
The patent extracts and removes the antioxidant stabilizer from the organic solvent system. By using high-purity organic solvents without added stabilizers, the source of the harmful residue is eliminated while maintaining solvent stability through alternative means such as purified storage conditions and minimized exposure to decomposition triggers.
Solution Approach 2:
The patent changes the purity parameter of the organic solvent by removing stabilizer additives. This parameter change transforms the solvent from a stabilized but residue-prone state to a high-purity state that eliminates stabilizer-related defects while maintaining adequate temporal stability for the intended application period.
2Object-affected harmful factors
If high-purity organic solvents are used without stabilizers, then defect failures are reduced, but the solvents undergo temporal decomposition and form peroxides and organic acids
Solution Approach 1:
The patent applies preliminary purification actions to remove potential decomposition products and impurities from the organic solvent before use. By pre-treating the solvent through filtration and purification processes, the system prevents the accumulation of peroxides and organic acids that would result from temporal decomposition, thereby maintaining solvent quality without requiring stabilizers.
3Object-affected harmful factors
If the stabilizer content is reduced to minimize defects, then defect inhibition improves, but the temporal stability of the organic solvent deteriorates
Solution Approach 1:
The patent adopts a disposable approach to organic solvents by using high-purity solvents without long-term stabilizers. The solvent is designed for short-term use in the manufacturing process, eliminating the need for long-term stability additives. After use, the solvent is discarded rather than stored for extended periods, thereby avoiding the temporal decomposition issue while maintaining defect inhibition.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively enhances the temporal stability of the organic solvent and inhibits defects in semiconductor devices by optimizing the stabilizer content, thereby improving the overall manufacturing process.
Implementation Method 1
a radical occurs in the molecule thereof and turns into a peroxide and then to an organic acid
Implementation Method 2
a radical occurs in the molecule thereof and turns into a peroxide and then to an organic acid
Implementation Method 3
an antioxidant is used... for the purpose of inhibiting temporal decomposition and the like
Implementation Method 4
the stabilizer remained on the substrate surface without being volatilized
Data Source
AI summary
An object of the present invention is to provide a solution which is excellent in both the temporal stability of an organic solvent and the defect inhibition properties. Another object of the present invention is to provide a solution storage body storing the solution, an actinic ray-sensitive or radiation-sensitive resin composition containing the solution, and a pattern forming method and a manufacturing method of a semiconductor device using the solution.The solution of the present invention is a solution containing an organic solvent and a stabilizer, in which a content of the stabilizer with respect to a total mass of the solution is 0.1 to 50 mass ppm.