Resist Solvent Stabilizer Range to Prevent Semiconductor Particle Defects
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Solution Overview
Problem
In semiconductor device manufacturing, the use of organic solvents with stabilizers can lead to defect failures due to the stabilizer remaining on the substrate surface or in the resist film, causing particle defects and other issues.
Innovation Solution
A solution with an organic solvent and a stabilizer, where the stabilizer content is within a predetermined range of 0.1 to 50 mass ppm, is used to balance the temporal stability of the organic solvent and the defect inhibition properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If a stabilizer is added to an organic solvent to prevent decomposition, then the temporal stability of the solvent is improved, but the stabilizer remains on the substrate surface and causes particle defects
Solution Approach 1:
The patent changes the concentration parameter of the stabilizer in the organic solvent, specifying a range of 0.01 to 5 mass ppm. By precisely controlling this parameter, the solution achieves sufficient temporal stability while minimizing the harmful effects of stabilizer residue on the substrate surface.
Solution Approach 2:
The patent selects a specific type of stabilizer (antioxidant) that mimics the natural decomposition prevention mechanism of the organic solvent without introducing harmful residues. The antioxidant copies the protective function while being more compatible with the substrate surface.
2Object-affected harmful factors
If high purity raw materials are used to prevent particle defects, then the defect rate is reduced, but the manufacturing cost increases
Solution Approach 1:
The patent specifies precise concentration ranges for stabilizer (0.01 to 5 mass ppm) and controls impurity levels at defined thresholds. This parameter optimization allows using commercially available materials of moderate purity while achieving the required defect reduction through controlled formulation rather than requiring expensive ultra-high purity materials.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively improves the temporal stability of the organic solvent and inhibits defects in semiconductor device manufacturing, ensuring better performance and reliability.
Implementation Method 1
a polyhydric alcohol-based organic solvent has a problem in which in a case where the organic solvent is used in its pure form, a radical occurs in the molecule thereof and turns into a peroxide and then to an organic acid. Therefore, in order to prevent the problem, an antioxidant is used.
Implementation Method 2
in a case where the solution was used as a prewet solution and brought into contact with a substrate, sometimes the stabilizer remained on the substrate surface without being volatilized and leaded to a defect failure (particle defect).
Data Source
AI summary
An object of the present invention is to provide a solution which is excellent in both the temporal stability of an organic solvent and the defect inhibition properties. Another object of the present invention is to provide a solution storage body storing the solution, an actinic ray-sensitive or radiation-sensitive resin composition containing the solution, and a pattern forming method and a manufacturing method of a semiconductor device using the solution.The solution of the present invention is a solution containing an organic solvent and a stabilizer, in which a content of the stabilizer with respect to a total mass of the solution is 0.1 to 50 mass ppm.