Resist Composition Stabilization via Nitrogen-Containing Organic Compound
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Solution Overview
Problem
Onium salt-based acid generators with fluorinated alkyl cation moieties in lithography resist compositions are prone to decomposition due to nucleophilic reactions with nitrogen-containing organic compounds, leading to inferior storage stability and lithography properties.
Innovation Solution
A resist composition combining a specific acid generator with a nitrogen-containing organic compound, featuring a compound represented by general formula (b0) and another compound represented by general formula (d1) or (d2), which improves storage stability and lithography properties by mitigating decomposition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If onium salt-based acid generators with fluorinated alkyl cation moieties are used, then lithography sensitivity and resolution are improved, but storage stability deteriorates due to decomposition from nucleophilic reactions with nitrogen-containing organic compounds
Solution Approach 1:
The patent introduces a nitrogen-containing organic compound as an intermediary substance that mediates between the acid generator and the resist base. This compound reacts with the fluorinated alkyl cation moiety of the onium salt-based acid generator to form a stable complex, preventing the nucleophilic decomposition that would otherwise occur. The intermediary compound thus protects the acid generator while maintaining its lithography functionality.
Solution Approach 2:
The patent modifies the chemical parameters of the acid generator by introducing a nitrogen-containing organic compound that changes the reactivity and stability characteristics of the fluorinated alkyl cation moiety. This parameter change transforms the acid generator from a highly reactive but unstable species into a more stable complex that maintains lithography performance while improving storage stability.
2Reliability
If nitrogen-containing organic compounds are added to suppress basic compound effects, then resistance to Post Exposure Delay is improved, but decomposition from nucleophilic reactions with acid generators increases
Solution Approach 1:
The patent converts the harmful nucleophilic reaction between nitrogen-containing organic compounds and fluorinated alkyl cation moieties into a beneficial stabilization mechanism. The nitrogen-containing organic compound, which would normally cause decomposition, is instead utilized to form a stable complex with the acid generator, thereby improving storage stability while maintaining the resistance to Post Exposure Delay effects.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition exhibits enhanced storage stability and improved lithography performance by stabilizing the acid generator and maintaining effective exposure and development characteristics.
Implementation Method 1
an acid generator component (B) that generates acid upon exposure
Implementation Method 2
prone to decomposition due to nucleophilic reactions with nitrogen-containing organic compounds
Implementation Method 3
the action of this acid causes an increase in the solubility of the resin component in an alkali developing solution
Data Source
AI summary
A resist composition including a base component that exhibits changed solubility in an alkali developing solution under the action of acid, an acid-generator component that generates acid upon exposure, and a nitrogen-containing organic compound, the acid generator component including an acid generator represented by general formula (b0), the nitrogen-containing organic compound including a compound represented by general formula (d1) or general formula (d2) in which each of R1 and R2 represents an aryl group or an alkyl group, Rf represents a fluorinated alkyl group, X−represents a counter anion, each of R3 and R4 represents an aliphatic hydrocarbon group, R5 represents a hydrocarbon group having 5 or more carbon atoms, and each of R6 and R7 independently represents a hydrogen atom, an aliphatic hydrocarbon group, or —C(═O)—O—R5.