Resist Structure State Transition Temperature Measurement
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Solution Overview
Problem
The challenge in determining the state transition temperature of resist structures, particularly in advanced nanoelectronics where interfacial interactions between resist and underlayer materials are dominant, making direct measurement difficult and influencing patterning performance.
Innovation Solution
A method to determine the state transition temperature of resist structures without contacting them, using heat treatment data to correlate spatial features before and after heating, allowing for the derivation of this temperature and optimizing interactions with underlayer materials.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If direct measurement methods are used to determine state transition temperature, then measurement accuracy may be improved, but the resist structure may be damaged or its properties may be altered by contact
Solution Approach 1:
The patent uses an intermediary substance (liquid crystal material) that mediates between the measurement system and the resist structure. The liquid crystal material contacts the resist structure during heat treatment, allowing optical measurement of temperature without requiring direct contact between sensors and the resist structure, thus avoiding damage while enabling accurate measurement
Solution Approach 2:
The patent replaces mechanical/contact-based temperature measurement systems with an optical measurement system. By using optical microscopy to observe liquid crystal transitions, the system eliminates the need for physical sensors that would contact and potentially damage the resist structure
2Length of moving object
If resist structure height is reduced to enable smaller features, then patterning resolution is improved, but interfacial interactions become increasingly dominant and difficult to measure
Solution Approach 1:
The liquid crystal material serves as an intermediary that amplifies and makes visible the interfacial interactions between the resist structure and underlying materials. By observing how the liquid crystal behaves at the interface during heat treatment, the system can detect subtle interfacial effects that would be difficult to measure directly in low-height structures
Solution Approach 2:
The patent changes the measurement parameter from direct physical measurement of interfacial forces to optical observation of liquid crystal phase transitions. This parameter change allows indirect detection of interfacial interactions through their effect on the liquid crystal material's state transition temperature
3Loss of information
If heat treatment is applied to determine state transition temperature, then material property information is obtained, but contacting the resist structure with sensors may influence the glass transition temperature
Solution Approach 1:
The patent replaces mechanical sensor contact with optical measurement during heat treatment. The liquid crystal material provides a visual indicator of temperature and material state changes without requiring physical sensors that would contact and potentially alter the glass transition temperature of the resist structure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables accurate determination of state transition temperatures for resist structures, providing insights into interfacial interactions and material properties, which can improve patterning performance and material screening.
Implementation Method 1
applying a heat treatment to the plurality of entities, wherein a temperature at which the heat treatment is applied is different for each entity of the plurality of entities
Implementation Method 2
determining a state transition temperature of the resist structure
Data Source
AI summary
A method for determining a value representative of a state transition temperature of a resist structure, formed of a resist material and having predetermined dimensions, on an underlayer material includes: receiving data earlier obtained, the data representing a correlation between a second value for a measure representative of a spatial feature of at least one resist structure of each of a plurality of entities after applying a heat treatment, and a temperature at which the heat treatment is applied, each entity comprising the at least one resist structure, formed of the resist material and having the predetermined dimensions before the heat treatment, on the underlayer material, and wherein the measure has a first value before the heat treatment, and determining, from the correlation, the value representative of the state transition temperature when the heat treatment would be performed at such temperature, the second value differs by a predetermined amount from the first value.