Responsive Layer Stress Tuning for Low-Frequency LWR Reduction
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing semiconductor manufacturing processes face challenges in reducing low frequency line width roughness (LWR) in extreme ultraviolet (EUV) patterning, which cannot be effectively addressed through etching processes.
Innovation Solution
A method involving a responsive layer, such as silicon or silicon nitride, is treated with UV exposure or thermal oxidation to induce tensile stress, causing a volumetric change that straightens sidewall profiles and reduces low frequency LWR.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a responsive layer is added to reduce low frequency LWR, then low frequency LWR is improved, but process complexity increases
Solution Approach 1:
The responsive layer serves multiple functions: it acts as a structural layer in the patterning stack, provides a platform for low frequency LWR reduction through responsive treatment, and maintains compatibility with standard etching processes for high frequency LWR control. This multi-functionality justifies the added structural element.
Solution Approach 2:
The responsive layer's properties are changed through a dedicated treatment process that induces tensile stress, transforming the layer's mechanical state to reduce low frequency LWR. This parameter change approach allows low frequency LWR reduction without fundamentally altering the etching process parameters.
2Manufacturing precision
If tensile stress is induced in the responsive layer to straighten sidewalls, then low frequency LWR is reduced, but additional treatment steps are required
Solution Approach 1:
The responsive layer is prepared in advance with the capability to undergo tensile stress treatment, allowing the low frequency LWR reduction to occur before final pattern transfer. This preliminary action ensures that the sidewall straightening is completed prior to subsequent patterning steps, maintaining productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The induced tensile stress in the responsive layer significantly reduces low frequency LWR, improving pattern transfer quality by straightening sidewalls and enhancing subsequent patterning into underlying layers.
Implementation Method 1
treating the responsive layer with an ultraviolet (UV) radiation exposure or a thermal oxidation in order to induce a tensile stress in the responsive layer
Implementation Method 2
treating the responsive layer with an ultraviolet (UV) radiation exposure or a thermal oxidation in order to induce a tensile stress in the responsive layer
Data Source
AI summary
Embodiments described herein relate to a method that includes forming a pattern in a resist layer that is provided over a patterning stack that includes a responsive layer. In an embodiment, the method may include transferring the pattern into the responsive layer, and applying a treatment to the responsive layer. In an embodiment, the treatment induces a tensile stress in the responsive layer and reduces a line width roughness (LWR) of the pattern.