Reticle Storing Container Purging Valve Particle Control
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Solution Overview
Problem
Current reticle storage containers for EUV lithography fail to effectively control particles smaller than 30 micrometers without the use of a thermophoretic source, which is not always necessary or desirable.
Innovation Solution
A reticle storing container design comprising an outer and inner container with a purging valve system, utilizing clean gas or vacuum pumping to reduce particle sizes without the need for a thermophoretic source, featuring a spring-loaded valve and filter pieces to enhance air-tightness and cleanliness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a thermophoretic source is used to drive particles away from the reticle, then particles can be controlled to gather on one side, but the device complexity increases and particles originally above the reticle may adhere to it
Solution Approach 1:
The patent removes the thermophoretic source from the system entirely. Instead of using active particle driving mechanisms, the invention relies on passive containment through the sealed container structure with purging capabilities, extracting the harmful complex component while maintaining particle control through simpler means
Solution Approach 2:
The patent creates an inert environment within the container by filling it with clean gas through the purging valve system. This inert atmosphere prevents particle generation and adhesion without requiring active thermophoretic sources, thus reducing device complexity while maintaining particle control
2Object-affected harmful factors
If clean rooms are used to prevent contamination, then reticle cleanliness is improved, but the status of absolute dustless is still inaccessible
Solution Approach 1:
The patent divides the storage system into separate sealed containers (outer container and inner container) that physically isolate the reticle from the external environment. This segmentation creates independent clean zones that can be maintained at different cleanliness levels, improving reticle cleanliness beyond what a single clean room environment can achieve
Solution Approach 2:
The patent introduces a purging valve system as an intermediary mechanism that actively manages the gas environment within the container. This intermediary system allows for controlled purging of contaminants and maintenance of clean gas atmosphere, thereby improving reticle cleanliness and achieving more reliable dustless conditions than passive clean rooms
3Object-affected harmful factors
If particles are driven toward one side of the reticle pod, then particles will not adhere to the reticle surface, but the device requires an extra thermophoretic source
Solution Approach 1:
The patent extracts the thermophoretic source from the system and replaces it with a passive sealed container design. Particle adhesion prevention is achieved through the sealed environment and controlled gas composition rather than active particle manipulation, thereby preventing particle adhesion without increasing device complexity
Solution Approach 2:
The patent changes the parameters of the gas environment within the container through the purging valve system. By controlling gas composition, pressure, and flow through the first and second through-holes, the system prevents particle adhesion to the reticle surface without requiring thermophoretic sources, thus achieving particle control through parameter changes rather than complex active mechanisms
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively reduces particle sizes within the container, maintaining reticle cleanliness during EUV lithography processes without the requirement for an additional thermophoretic source, ensuring high-resolution pattern definition on silicon wafers.
Implementation Method 1
the valve part compresses the spring for the purging valve to be connected to the purging head
Implementation Method 2
exhausting the gas in the reticle storing container by a vacuum pump
Data Source
AI summary
A reticle storing container is disclosed to include an outer container, an inner container, and a purging valve. The outer container comprises a container body and a container base on which at least a first through-hole is disposed, and a first inner space is formed between the container body and the container base for storing the inner container. The inner container comprises a top cover and a bottom base on which at least a second through-hole connected to the first through-hole is disposed, and a second inner space is formed between the top cover and the bottom base for storing a reticle. The purging valve is disposed in the first through-hole on the outer container base and connected to the second through-hole of said inner container, wherein the purging valve comprises a spring and a valve part. Thus, when the valve part is propped up by a purging head, the valve part compresses the spring for the purging valve to be connected to the purging head. And a filter material is disposed on the joint portion between the container body and the container base to prevent the interior of the reticle from being contaminated.