Reticle Inspection Defect Data Programming via CAD Embedding
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Solution Overview
Problem
Conventional reticle inspection apparatuses face difficulties in programming small defects accurately, measuring defect sizes objectively, handling diverse semiconductor designs, and preparing samples with varied defect characteristics, leading to inefficiencies and increased time in sensitivity evaluation.
Innovation Solution
A method and system that generate program defect information by embedding defect data into CAD data, allowing for sensitivity evaluation within the reticle inspection apparatus without a real reticle, enabling precise programming and measurement of defects, and reducing the need for separate defect-programmed and defect-free reticles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If defects are programmed on real reticles for sensitivity evaluation, then the evaluation can be performed, but the programming accuracy deteriorates for small defects and the preparation time increases
Solution Approach 1:
The patent creates virtual copies of defects by embedding defect information directly into CAD data instead of physically programming defects on real reticles. This digital copying approach maintains precise defect characteristics while eliminating time-consuming manual programming and measurement processes
Solution Approach 2:
The patent replaces the mechanical process of physically programming defects on reticles with automated data processing. Defect information is embedded into CAD data through computational operations, substituting manual mechanical programming with automated digital processes that achieve higher precision and speed
2Adaptability or versatility
If multiple reticles with various defect characteristics are prepared for diverse semiconductor designs, then comprehensive evaluation is achieved, but the device complexity and preparation costs increase
Solution Approach 1:
The patent creates a universal system where a single defect-data programming apparatus can handle diverse semiconductor designs by embedding different defect information into CAD data. This multi-functional approach allows comprehensive evaluation coverage without requiring separate physical reticles for each design type
Solution Approach 2:
The patent achieves adaptability to diverse semiconductor designs by changing the defect information parameters embedded in CAD data rather than changing physical reticles. Different defect types, sizes, and positions can be programmed by modifying data parameters, enabling comprehensive evaluation without increasing physical device complexity
Data Source
AI summary
A program defect condition is input to a defect-data programming apparatus which programs defect data for evaluation of a reticle inspection apparatus, thereby generating program defect information, program-defect-information-free source CAD data is converted to CAD data of a format with which the CAD data is input to the reticle inspection apparatus, and the program defect information is embedded into the converted CAD data, thereby generating program-defect-information-present CAD data for inspection apparatus. The program-defect-information-present CAD data for inspection apparatus is input to the reticle inspection apparatus together with a program-defect-information-free reticle produced based on the program-defect-information-free source CAD data, for execution of sensitivity evaluation. Program defect information needed to execute sensitivity evaluation of the reticle inspection apparatus is generated on that CAD data which is input to the reticle inspection apparatus, not on a real reticle.