Reticle Exposure Apparatus Aperture Segmentation
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Solution Overview
Problem
Current exposure apparatuses for forming reticles in photolithography processes face inefficiencies in forming complex patterns due to the need for multiple shots and beam axis adjustments, which increase processing time and may result in beam aberration.
Innovation Solution
An exposure apparatus and method utilizing a second aperture plate with variously shaped apertures that can be rotated or moved to directly overlap the first aperture, allowing the electron beam to pass through and form multiple exposure patterns in a single shot without changing the beam axis, thereby reducing exposure time and preventing beam aberration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple shots and beam axis adjustments are used to form complex patterns, then pattern complexity is improved, but processing time increases and beam aberration occurs
Solution Approach 1:
The patent divides the aperture control function into two separate aperture plates: a first aperture plate with a single aperture and a second aperture plate with multiple pattern-specific apertures. This segmentation allows the system to select different patterns by switching aperture plates rather than adjusting the beam axis multiple times, thereby reducing processing time while maintaining the ability to form complex patterns.
Solution Approach 2:
The patent pre-configures multiple apertures with different patterns on the second aperture plate before the exposure process begins. This preliminary preparation eliminates the need for real-time beam axis adjustments during exposure, as the desired pattern aperture is already in position, thus reducing processing time and preventing beam aberration.
2Adaptability or versatility
If multiple shots and beam axis adjustments are used to form complex patterns, then pattern complexity is improved, but beam aberration increases
Solution Approach 1:
By segmenting the aperture control into two separate plates, the system maintains a fixed beam axis while achieving pattern complexity through aperture selection. This eliminates beam axis adjustments that cause aberration, preserving beam quality while still enabling complex pattern formation.
Solution Approach 2:
The second aperture plate acts as an intermediary element that provides pattern selection capability without requiring beam axis movement. The aperture plate mediates between the fixed beam source and the substrate, allowing pattern complexity to be achieved through aperture geometry rather than beam direction changes, thus preventing beam aberration.
3Device complexity
If a single aperture is used for exposure, then device simplicity is improved, but pattern versatility deteriorates
Solution Approach 1:
The patent segments the aperture system into two plates: the first aperture plate maintains simplicity with a single aperture, while the second aperture plate provides pattern versatility with multiple pre-configured apertures. This segmentation allows the system to maintain overall simplicity while achieving pattern variety through the modular second plate.
Solution Approach 2:
The system introduces dynamic aperture selection capability through the second aperture plate, which can be switched between different pattern configurations. This dynamic element is added to the otherwise static and simple first aperture plate, creating a system that balances simplicity with versatility through controlled complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the formation of complex semiconductor circuit patterns with reduced exposure time and improved beam quality, allowing for the creation of both regular and irregular patterns efficiently by selecting appropriate apertures, thus enhancing the reticle formation process.
Implementation Method 1
an electron gun for projecting an electron beam
Data Source
AI summary
A method of forming a reticle includes: loading a blank reticle; projecting an electron beam; moving a second aperture plate having a first pattern aperture and a second pattern aperture so that the first pattern aperture is directly overlapped by a first aperture of a first aperture plate, the electron beam passing through the first pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the first pattern aperture, to form a first exposure pattern; moving the second aperture plate so that the second pattern aperture is directly overlapped by the first aperture of the first aperture plate, the electron beam passing through the second pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the second pattern aperture, to form a second exposure pattern; and developing the blank reticle having the first and second exposure patterns to form the reticle having first and second patterns.